Formation of A-centres and divacancies in silicon p + -n-n + structures was investigated for 4 MeV electron irradiation in the low-intensity range of 10 11 -5 × 10 12 cm −2 s −1 . It is shown that the introduction rates of both A-centres and divacancies increase with intensity in this range and then saturate at intensities above 10 12 cm −2 s −1 . Using the data from the literature the introduction rates of these defects are discussed in a wide range of intensities of electron irradiation of 10 11 -10 15 cm −2 s −1 , indicating a consistent role of carbon interstitial atoms and electron-enhanced migration of Si self-interstitials in the observed behaviour of introduction rates.