“…When the matrix is subjected to λ > 345 nm radiation the bands due to the CS 2 ···HONO complexes gradually diminish, and, in addition, the bands due to HONO also slightly diminish. Simultaneously, the bands characteristic for the primary and secondary HONO photolysis products appear, NO, NO 2 , N 2 O 3 , H 2 O, that were reported earlier. ,− However, we did not observe the band due to the OH free radical that was observed in our earlier study. ,, This is perhaps because most of the HONO present in the matrix interacts with CS 2 and the OH radicals formed during complex photolysis react immediately with CS 2 . Our earlier studies suggest that OH originating from HONO monomer photolysis, similarly like the OH radicals formed in H 2 O 2 photolysis, can escape the matrix cage .…”