Photochemistry and Patterning of Monolayer Films from 11-Phenylundecyltrichlorosilane

Friedli, Andrienne C.; Roberts, Rachel D.; Dulcey, C. S.; Hsu, Andro; McElvany, Stephen W.; Calvert, Jeffrey M.

doi:10.1021/la030353m

Cited by 19 publications

(15 citation statements)

References 22 publications

(54 reference statements)

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“…In this example, the resolution of patterns is limited by diffraction. In other works, they proposed the use of phenyl, naphthyl and anthracenyl precursors for DUV photopatterning because of the strong absorption of the phenyl groups for the DUV wavelengths 16 – 19 . Another approach to modifying the nature of an SAM with spatial control has been proposed by Whitesides et al .…”

Section: Introductionmentioning

confidence: 99%

Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly

Leuschel

Gwiazda

Heni

et al. 2018

Sci Rep

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Deep-UV (DUV) laser patterning has been widely used in recent years for micro- and nanopatterning, taking advantage of the specific properties of irradiation with high-energy photons. In this paper, we show the usefulness of DUV laser patterning for preparing surfaces with controlled chemical properties at the micro- and nanoscale. Our motivation was to develop a simple and versatile method for chemical patterning at multiscales (from mm to nm) over relatively wide areas (mm2 to cm2). The chemical properties were provided by self-assembled monolayers (SAMs), prepared on glass or silicon wafers. We first investigated their modification under our irradiation conditions (ArF laser) using AFM, XPS and contact angle measurements. Photopatterning was then demonstrated with minimum feature sizes as small as 75 nm, and we showed the possibility to regraft a second SAM on the irradiated regions. Finally, we used these chemically patterned surfaces for directed self-assembly of several types of objects, such as block copolymers, sol-gel materials and liquids by vapor condensation.

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Section: Introductionmentioning

confidence: 99%

Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly

Leuschel

Gwiazda

Heni

et al. 2018

Sci Rep

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“…Basically, control of chemical reactivity by external stimuli is essential for achieving the desired patterns . Amongst different techniques, UV‐photoinduced chemical patterning has been widely employed for micro‐ and nanopatterning . In this case, following the photoinduced chemical reactions of the functional groups on the photoresist, the irradiated polymer does not need to be removed thus rendering the process environmentally benign…”

Section: Figurementioning

confidence: 99%

“…[7] Amongst different techniques,U V-photoinduced chemical patterning has been widely employed for micro-and nanopatterning. [7][8][9][10][11][12][13] In this case,following the photoinduced chemical reactions of the functional groups on the photoresist, the irradiated polymer does not need to be removed thus rendering the process environmentally benign. [14,15] UV light has been commonly employed for two-dimensional (2D) and 3D optical data-storage systems.…”

mentioning

confidence: 99%

Chemical Patterning in Single Crystals of Metal–Organic Frameworks by [2+2] Cycloaddition Reaction

Park

Lee

et al. 2019

Angewandte Chemie

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Conventional chemical patterning involves films of polymeric materials. Herein, we demonstrate that the presence or absence of guest solvents in the crystal voids modulates the patterning of the cyclobutane rings in highly strained metal–organic frameworks (MOFs) under UV light. The olefin pairs of the spacer ligands, which resemble a ladder‐like structure, in the MOF, undergo a [2+2] cycloaddition reaction in a single‐crystal‐to‐single‐crystal manner. For instance, a partial photoreaction in the MOFs in the absence of a guest solvent as well as with dimethylacetamide in the voids generated two different patterns of the cyclobutane rings. Surprisingly, the MOF with the lattice dimethylformamide undergoes 100 % photoreaction, but the photoproduct contains broken chains. Such chemical patterning at the molecular level represents a next step in crystal engineering.

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“…The iconic experiment in the development of such techniques was carried out in 1990 by Eigler and Schweizer [36], where xenon atoms were manipulated on a Ni (110) surface in a manner such as to write 'IBM' with the xenon atoms. Also, stadium type quantum corrals have been assembled by depositing a close line of Fe atoms on a Cu (111) surface [37]. Nanomanipulation techniques are continually being developed [38,39] and they provide a route to the ultimate limit of fabrication.…”

Section: Nanomanipulationmentioning

confidence: 99%

Engineering nanostructures at surfaces using nanolithography

Diegoli

Hamlett

Leigh

et al. 2007

Proceedings of the Institution of Mechanical Engineers, Part G:

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In just a few years, exploring nanostructured materials has become a new theme common to many disciplines of science and engineering. Recent surge of interest in these nanostructured systems stems from the remarkable effects that may arise from the critical size reduction. Structured materials on the nanometre scale can lead to improved and sometimes novel properties with emerging applications ranging from novel highly functional devices to advanced chemical and biological sensors. Significant advances made in nanomaterials research, together with improved lithographic fabrication strategies have led to dramatic enhancements in the creation of complex and well-defined nanostructures on surfaces. This article reviews the status of research and development in nanostructured materials, with particular focus on the recent advances on nanolithographic techniques. Finally, perspectives and future challenges in this emerging field of research are also discussed.

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Photochemistry and Patterning of Monolayer Films from 11-Phenylundecyltrichlorosilane

Cited by 19 publications

References 22 publications

Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly

Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly

Chemical Patterning in Single Crystals of Metal–Organic Frameworks by [2+2] Cycloaddition Reaction

Engineering nanostructures at surfaces using nanolithography

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