Abstract. The photochemistry of the ci-phenyl-P,y-enones 3-6 has been studied under conditions of direct ( h 300 nm) and triplet-sensitized irradiation. Upon direct irradiation, 3 exhibits decarbonylation, a 1,3-acyl shift (1,3-AS) and an oxa-di-n-methane (ODPM) rearrangement. Under the same conditions, 4, on the other hand, affords only the ODPM product whereas 5 gives the decarbonylation, 1,3-AS and ODPM products. The formation of the ODPM product of 5 is efficiently quenched by triplet quenchers in contrast to the ODPM products of 3 and 4, the quantum yields of which are not reduced upon the addition of typical triplet quenchers. Triplet-sensitized irradiation of 5 leads to the ODPM rearrangement, whereas surprisingly 3 and 4 are unreactive. It is suggested that the ODPM rearrangement, upon direct irradiation of 3 and 4, proceeds from the S2(nn*) state. The ODPM product formed upon direct irradiation of 5 is thought to be formed from the T'(nn*) state populated by ISC from the S'(nn*) state. Upon direct irradiation, 6 exhibits a reversible 1,3-AS and in addition ketene formation via an intramolecular 1,5-H shift. Under conditions of triplet photosensitization, compound 6 appears to be stable. Given the apparently different photochemical behaviour of these constrained compounds, a general reactivity pattern for the direct and sensitized irradiation cannot be defined.