Photocatalytic WO3/TiO2 nanowires: WO3 polymorphs influencing the atomic layer deposition of TiO2

Nagy, D.; Firkala, Tamás; Drotár, Eszter; Szegedi, Ágnes; László, Krisztina; Szilágyi, Imre Miklós

doi:10.1039/c6ra18899k

Cited by 46 publications

(11 citation statements)

References 78 publications

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“…Production of hydrogen from water splitting needs an external energy source and solar energy is an attractive choice, forming a complete renewable energy cycle. Photoelectrochemical splitting of water on semiconductor electrode materials (n-type TiO 2 ) is an efficient and inexpensive way of producing clean hydrogen fuel [421][422][423][424][425][426][427][428][429][430]. The major challenges in this research field range from reactor design to the discovery of novel high-surface area nanostructured materials that can achieve decent activity levels [421][422][423][424][425][426][427][428][429][430].…”

Section: Photocatalysismentioning

confidence: 99%

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

Bıyıklı

Haider

2017

Semicond. Sci. Technol.

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In this paper, we present the progress in the growth of nanoscale semiconductors grown via atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD became a widespread tool to grow functional films and conformal ultra-thin coatings for various applications. Based on self-limiting and ligand-exchange-based surface reactions, ALD enabled the low-temperature growth of nanoscale dielectric, metal, and semiconductor materials. Being able to deposit wafer-scale uniform semiconductor films at relatively low-temperatures, with sub-monolayer thickness control and ultimate conformality, makes ALD attractive for semiconductor device applications. Towards this end, precursors and low-temperature growth recipes are developed to deposit crystalline thin films for compound and elemental semiconductors. Conventional thermal ALD as well as plasma-assisted and radical-enhanced techniques have been exploited to achieve device-compatible film quality. Metal-oxides, III-nitrides, sulfides, and selenides are among the most popular semiconductor material families studied via ALD technology. Besides thin films, ALD can grow nanostructured semiconductors as well using either template-assisted growth methods or bottom-up controlled nucleation mechanisms. Among the demonstrated semiconductor nanostructures are nanoparticles, nano/ quantum-dots, nanowires, nanotubes, nanofibers, nanopillars, hollow and core-shell versions of the afore-mentioned nanostructures, and 2D materials including transition metal dichalcogenides and graphene. ALD-grown nanoscale semiconductor materials find applications in a vast amount of applications including functional coatings, catalysis and photocatalysis, renewable energy conversion and storage, chemical sensing, opto-electronics, and flexible electronics. In this review, we give an overview of the current state-of-the-art in ALD-based nanoscale semiconductor research including the already demonstrated and future applications.

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Section: Photocatalysismentioning

confidence: 99%

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

Bıyıklı

Haider

2017

Semicond. Sci. Technol.

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“…However, it has a significant setback of high bandgap that makes it utilize only UV light during photocatalysis, also photogenerated electron-hole pairs recombine very fast [4][5][6][7]. Many studies have been done to prepare high-performance TiO 2 catalysts by making nanostructure composites of TiO 2 with noble metals and other semiconductor oxides like WO 3 [8][9][10]. Coupling TiO 2 -based nanofibers with heteroatom dopants lead to extra energy levels in the TiO 2 band gap that allows for the absorption of visible light photons [11].…”

Section: Introductionmentioning

confidence: 99%

Preparation of TiO2/WO3/C/N Composite Nanofibers by Electrospinning Using Precursors Soluble in Water and Their Photocatalytic Activity in Visible Light

Odhiambo

Mustafa

et al. 2021

Nanomaterials

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Extending the absorption range of TiO2 nanofibers to visible light is a great improvement of the photocatalytic property of TiO2. In this study, TiO2/WO3/C/N nanofibers were prepared by electrospinning using precursors soluble in water then annealing in argon. Titanium(IV) bis(ammonium lactato)dihydroxide (TiBALDH) and ammonium metatungstate (AMT) were used as the precursor for TiO2 and WO3 respectively. Different volume ratios of the precursors were added to a solution of PVP before electrospinning. The fibers were studied by XPS, SEM-EDX, TEM, FTIR, XRD, Raman spectroscopy and UV–VIS diffuse reflectance spectroscopy (DRS). The photocatalytic degradation of methylene blue by the fibers in visible light was investigated. The fibers had anatase TiO2 and monoclinic WO3. Based on UV–VIS DRS and Kubelka-Munk function the fibers could absorb visible light. Moreover, 100% TiBALDH had an indirect band gap of 2.9 eV, and the band gap decreased with increase in AMT, i.e., for 0% TiBALDH, band gap was 2.4 eV. The fibers degraded methylene blue dye in visible light, and 90% TiBALDH had the highest photocatalytic activity, i.e., it degraded 40% of the dye after 240 min.

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“…The main challenges in enhancing the efficiency of the photocatalytic activity of TiO 2 are to increase its light-absorbing range to a higher wavelength and to decrease the speed of the charge carriers to recombine [1][2][3][4][5]. Different methods of overcoming these problems have been reported.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of TiO2/WO3 Composite Nanofibers by a Water-Based Electrospinning Process and Their Application in Photocatalysis

et al. 2020

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TiO2/WO3 nanofibers were prepared in a one-step process by electrospinning. Titanium(IV) bis(ammonium lactato)dihydroxide (TiBALDH) and ammonium metatungstate (AMT) were used as water-soluble Ti and W precursors, respectively. Polyvinylpyrrolidone (PVP) and varying ratios of TiBALDH and AMT were dissolved in a mixture of H2O, EtOH and CH3COOH. The as-spun fibers were then heated in air at 1 °C min−1 until 600 °C to form TiO2/WO3 composite nanofibers. Fiber characterization was done using TG/DTA, SEM–EDX, FTIR, XRD, and Raman. The annealed composite nanofibers had a diameter range of 130–1940 nm, and the results showed a growth in the fiber diameter with an increasing amount of WO3. The photocatalytic property of the fibers was also checked for methyl orange bleaching in visible and UV light. In visible light, the photocatalytic activity increased with an increase in the ratio of AMT, while 50% TiBALDH composite fibers showed the highest activity among the as-prepared fibers in UV light.

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Photocatalytic WO₃/TiO₂ nanowires: WO₃ polymorphs influencing the atomic layer deposition of TiO₂

Abstract: Study on h-WO3/TiO2 nanowires as ALD nucleation of TiO2 was found to be influenced by the WO3 polymorphs.

Cited by 46 publications

References 78 publications

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

Preparation of TiO2/WO3/C/N Composite Nanofibers by Electrospinning Using Precursors Soluble in Water and Their Photocatalytic Activity in Visible Light

Synthesis of TiO2/WO3 Composite Nanofibers by a Water-Based Electrospinning Process and Their Application in Photocatalysis

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