Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

Lin, Wei Chen; Huang, C.H.; Yang, W.J.; Hsu, Cheng-Ying; Hou, Kuang-Hua

doi:10.1016/j.cap.2010.05.014

Cited by 17 publications

(8 citation statements)

References 23 publications

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“…It means that the film even deposited at the highest temperature of 200 ∘ C is still amorphous. Figure 2 shows the XPS characteristic spectra of La, Ti, O, and contamination C, which were detected in the XPS survey spectra of the film prepared at 125 ∘ C. The peak of Ti2p3 of 457.97 eV in Figure 2 was close to the value of 457.80 eV in Ti 2 O 3 [16]. The peak of La3d5 was 834.12 eV corresponding to 834.80 eV of La 2 O 3 [17].…”

Section: Methodsmentioning

confidence: 87%

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO₃ Thin Films

Yang

et al. 2018

Advances in Condensed Matter Physics

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LaTiO3 films were prepared under various deposition temperatures using electron beam evaporation on Si and fused quartz substrates. The relationship between the deposition temperature and structure and properties of optics was investigated by XPS, XRD, and various optical testing. The results showed that the LaTiO3 film is amorphous when the deposition temperature is below 200°C. The refractive index of LaTiO3 films increases from 1.8302 to 1.9112 at 1064 nm with the rise of deposition temperature. The extinction coefficient of LaTiO3 films is less than 10−6 in the range of 350 to 1700 nm. The laser damage threshold increases at first and then decreases with the increase of deposition temperature. The maximum of the laser damage threshold was 18.18 J/cm2 when the deposition temperature was 150°C. Compared with TiO2 film, the chemical structure and the laser damage threshold of LaTiO3 film are more stable by preparation of electron beam evaporation.

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Section: Methodsmentioning

confidence: 87%

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO₃ Thin Films

Yang

et al. 2018

Advances in Condensed Matter Physics

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“…Since the densification of layers is correlated with the thickness of the films, an increase in the sputter power increases the deposition rate at the target [57,73]. Yang et al [35] found that a high sputtering power can increase the surface roughness of the film, which results in decreased transmittance [57,74]. The surface roughness affects the contact angle of films; the contact angle increases with roughness [75].…”

Section: Sputtering Powermentioning

confidence: 99%

“…The surface roughness affects the contact angle of films; the contact angle increases with roughness [75]. Many researchers have demonstrated that the rutile phase is more hydrophilic than the anatase phase [74,76,77]. Therefore, the sputtering power is an importer factor when the magnetron sputtering process is used to fabricate TiO 2 films.…”

Section: Sputtering Powermentioning

confidence: 99%

“…The effects of the argon/oxygen ratio on the photocatalytic activity of TiO 2 films have been extensively investigated. Many researchers have found that a lot of properties of TiO 2 film are affected by the argon/oxygen ratio in magnetron sputtering, including the deposition rate [62,74,82,102,103], grain size and surface roughness [37,76,87,104], crystallinity and surface chemical composition [33,86], and optical properties [1,37,62,105]. The dissociation energy of argon is about 15.76 eV and that of oxygen is about 48.77 eV.…”

Section: Argon/oxygen Ratiomentioning

confidence: 99%

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A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Wang

Rahman

et al. 2020

Catalysts

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Titanium dioxide (TiO2) thin films are used for a broad range of applications such as wastewater treatment, photocatalytic degradation activity, water splitting, antibacterial and also in biomedical applications. There is a wide range of synthesis techniques for the deposition of TiO2 thin films, such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), both of which are well known deposition methods. Layer by layer deposition with good homogeneity, even thickness and good adhesive nature is possible by using the PVD technique, with the products being used for photocatalytic applications. This review studies the effects of magnetron sputtering conditions on TiO2 films. This innovative technique can enhance the photocatalytic activity by increasing the thickness of the film higher than any other methods. The main purpose of this article is to review the effects of DC and RF magnetron sputtering conditions on the preparation of TiO2 thin films for photocatalysis. The characteristics of TiO2 films (i.e., structure, composition, and crystallinity) are affected significantly by the substrate type, the sputtering power, the distance between substrate and target, working pressure, argon/oxygen ratio, deposition time, substrate temperature, dopant types, and finally the annealing treatment. The photocatalytic activity and optical properties, including the degree of crystallinity, band gap (Eg), refractive index (n), transmittance (T), and extinction coefficient (k), of TiO2 films are dependent on the above- mentioned film characteristics. Optimal TiO2 films should have a small particle size, a strong degree of crystallinity, a low band gap, a low contact angle, a high refractive index, transmittance, and extinction coefficient. Finally, metallic and nonmetallic dopants can be added to enhance the photocatalytic activity of TiO2 films by narrowing the band gap.

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“…When TiO 2 powders are used as photocatalyst for the degeneration of pollutants in liquid, several practical problems in photochemical processing are apparent: (i) separation of the catalyst from the suspension after the reaction is difficult, (ii) the suspended particles tend to aggregate, especially when they are present at high concentrations and (iii) particulate suspensions are not easily applicable to continuous flow systems [30]. To avoid these technical problems, TiO 2 catalysts can be prepared in film form which are always grown on supporting substrates, such as glass [31], silicon [32], indium tin oxide [33], sapphire [34], stainless steel [35], SrTiO 3 [36], LaAlO 3 [37] and fluorine tin oxide (FTO) [38]. However, the influence of substrate on structural properties and photocatalytic activity of TiO 2 films has not been investigated so far.…”

mentioning

confidence: 99%

Influence of substrate on structural properties and photocatalytic activity of TiO ₂ films

Pan

Fan

et al. 2017

Micro & Nano Letters

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Titanium dioxide (TiO 2) thin films were successfully grown on glass (TiO 2 /glass) and fluorine tin oxide (TiO 2 /FTO) substrates by using radio frequency magnetron sputtering. The as-prepared films were characterised and compared by X-ray diffraction, scanning electron microscopy, atomic force microscopy, ultraviolet-visible spectroscopy and photocatalytic test. It was found that the film deposited on FTO has better crystallinity, rougher superficial morphology, narrower optical bandgap and higher photocatalytic efficiency. The relationship between the factors and the photocatalytic performance has been analysed. Besides, it has been found that the internal electric field developed at the interface of TiO 2 /FTO may also play a positive effect on the improvement of the photocatalytic efficiency.

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Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

Cited by 17 publications

References 23 publications

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO₃ Thin Films

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO₃ Thin Films

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Influence of substrate on structural properties and photocatalytic activity of TiO ₂ films

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Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

Cited by 17 publications

References 23 publications

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO3 Thin Films

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO3 Thin Films

A Review on the Pathways of the Improved Structural Characteristics and Photocatalytic Performance of Titanium Dioxide (TiO2) Thin Films Fabricated by the Magnetron-Sputtering Technique

Influence of substrate on structural properties and photocatalytic activity of TiO 2 films

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Product

Resources

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Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO₃ Thin Films

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO₃ Thin Films

Influence of substrate on structural properties and photocatalytic activity of TiO ₂ films