Photocatalytic properties of transparent TiO2 coatings doped with neodymium

Abstract

In this work photocatalytic properties of TiO 2 thin fi lms doped with 8.51 at. % of Nd were described. The self-cleaning phenomenon of thin fi lms was discussed together with the structural, optical and surface properties of prepared thin fi lms. Transparent coatings based on titanium dioxide were manufactured by high-energy reactive magnetron sputtering process. Incorporation of Nd during sputtering process results in amorphous behavior, without a signifi cant infl uence on transparency and colour as compared to the undoped TiO 2 -rutile matrix. Nevertheless, doping with neodymium doubles the photocatalytic activity of the matrix due to higher quantity of photo-generated charge carriers and more effi cient mechanism of energy transfer.

Influence of Nd dopant amount on microstructure and photoluminescence of TiO2:Nd thin films

“…5). The width of the optical band gap energy (E g ) of undoped TiO 2 was equal to 3.13 eV and it is in good correlation with values reported by others [51][52][53]. For TiO 2 thin films doped with neodymium in the amount from 0.6 to 2.0 at.% values of E g remained very similar (3.1-3.14 eV) to undoped titania and obtained differences were within the measurements error.…”

Preparation and Photocatalytic Characterization of Modified TiO2/Nd/rice Husk Ash Nanomaterial for Rifampicin Removal in Aqueous Solution

“…As a result, visible light can excite electrons from this intermediate energy level (4f) to the conductive region energy. This is also agreement with the studies on TO2 modified using rare earth elements (Wojcieszak, Kaczmarek et al 2012, Wojcieszak, Mazur et al 2014).…”

Annealing temperature induced improved crystallinity of YSZ thin film

“…The lowest RMS surface roughness obtained at 500°C implied complete homogeneous distribution of grains into fine structure which agreed with XRD analysis, suggesting annealing temperature induces preferential growth of YSZ nanocrystallites. According to Wojcieszak et al [39], YSZTFs with lowest RMS surface roughness (≈0.14 nm) may not necessarily influence the crystallinity of the film. Film annealed at 600°C displayed uniform and dense structure without agglomeration of moderate number of fine grains.…”