2008
DOI: 10.1149/1.2815484
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Photocatalytic Activity of Atomic Layer Deposited TiO[sub 2] Coatings on Austenitic Stainless Steels and Copper Alloys

Abstract: Photocatalytic activity of TiO 2 -coated austenitic stainless steel ͑AISI 304͒ and copper alloys ͓deoxidized high phosphorus ͑DHP͒ copper and Nordic Gold͔ was studied by means of decomposition of methylene blue model waste water and open-circuit electrochemical potential measurements, and the photoinduced hydrophilicity was studied by means of contact angle measurements of water under ultraviolet irradiation. The TiO 2 coatings were prepared by an atomic layer deposition technique from TiCl 4 and H 2 O. The th… Show more

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Cited by 30 publications
(16 citation statements)
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“…For instance, Pore et al deposited TiO 2 layers from Ti(OCH 3 ) 4 and H 2 O at different temperatures and observed an increase in photocatalytic activity for thicker films up to 100 nm grown at 325 °C. Kawakami et al reported low photocatalytic activity for 5 and 10 nm thin films, while good photocatalytic activity was observed for thicker films of 50 nm or more. They assign these results to the ALD process based on TiCl 4 and H 2 O, where the crystallinity of the films is negligible at the start of the process, but anatase crystal growth occurs when a thickness of 50 nm is reached.…”
Section: Resultsmentioning
confidence: 99%
“…For instance, Pore et al deposited TiO 2 layers from Ti(OCH 3 ) 4 and H 2 O at different temperatures and observed an increase in photocatalytic activity for thicker films up to 100 nm grown at 325 °C. Kawakami et al reported low photocatalytic activity for 5 and 10 nm thin films, while good photocatalytic activity was observed for thicker films of 50 nm or more. They assign these results to the ALD process based on TiCl 4 and H 2 O, where the crystallinity of the films is negligible at the start of the process, but anatase crystal growth occurs when a thickness of 50 nm is reached.…”
Section: Resultsmentioning
confidence: 99%
“…The specimens were coated by TiO 2 using atomic layer deposition in Planar Systems Inc. (Espoo, Finland) with H 2 O as an oxygen source and TiCl 4 as a titanium precursor [32]. Anatase-type coatings with the thickness of 50 and 100 nm (50 nm (A), 100 nm (A)) and rutile-type coatings with the thickness of 100 and 150 nm (100 nm (R), 150 nm (R)) were selected for the investigation based on the previous studies [26,31].…”
Section: Specimen Preparationmentioning
confidence: 99%
“…Following previous studies [2,26,27,33], we assumed the pseudo-first-order kinetics for the MB decomposition by TiO 2 with the time dependence of concentration:…”
Section: Photocatalytic Activity Measurementsmentioning
confidence: 99%
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