2009
DOI: 10.1088/0022-3727/42/13/135201
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Photo-resist stripping process using atmospheric micro-plasma system

Abstract: A capillary electrode based micro-plasma system was utilized to evaluate the photo-resist stripping effect. Argon and nitrogen micro-plasmas were, respectively, employed as the working gas and ignited under atmospheric pressure. The result showed that the latter system required a much higher breakdown voltage than the former one to keep the micro-plasma in a steady state. Nitrogen micro-plasma with the inclusion of atmospheric oxygen was relatively rich in N, O-containing varieties, which thereafter induced co… Show more

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Cited by 11 publications
(9 citation statements)
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“…The presence of chemical species is demonstrated in Figure 2(a) which shows typical optical spectra emitted from Ar both without and with an entrained CCl 4 vapor. Figure 2(a) clearly shows the presence of Cl, Cl 2 and C 2 species in addition to the excited Ar neutral species,12–14 when haloalkane chemistry is added to the plasma jet. Cl 2 emission at 258 nm15, 16 from Ar, Ar/CH 2 Cl 2 , Ar/CHCl 3 , and Ar/CCl 4 is shown in Figure 2(b) to compare the relative amount of Cl 2 generated in the plasma, which contribute to the tissue removal rate.…”
Section: Methodsmentioning
confidence: 99%
“…The presence of chemical species is demonstrated in Figure 2(a) which shows typical optical spectra emitted from Ar both without and with an entrained CCl 4 vapor. Figure 2(a) clearly shows the presence of Cl, Cl 2 and C 2 species in addition to the excited Ar neutral species,12–14 when haloalkane chemistry is added to the plasma jet. Cl 2 emission at 258 nm15, 16 from Ar, Ar/CH 2 Cl 2 , Ar/CHCl 3 , and Ar/CCl 4 is shown in Figure 2(b) to compare the relative amount of Cl 2 generated in the plasma, which contribute to the tissue removal rate.…”
Section: Methodsmentioning
confidence: 99%
“…Discharge at atmospheric pressure does not require the use of expensive vacuum pumps. Due to its specifi c features, fi elds of plasma application are very wide: from biomedicine (sterilization, deactivation of bacteria and viruses on living tissues) via UV and VUV radiation as well as visible light sources and in gas processing to typical technical application (treatment and modifi cation of various surfaces) [3][4][5][6][7][8][9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…Jung and Choi (2006) had etched PR material by Ar/O 2 and He/O 2 gas. Chen et al (2009) had also stripped PR material based on the APPJ system and considered N 2 and Ar as working gas. Yoshiki et al (2002) had locally etched PR material based on micro-APPJ, used O 2 as working gas; an RF source (13.56 MHz) was used.…”
Section: Introductionmentioning
confidence: 99%