Photo-induced crosslinking of water-soluble polymers with a new photobase generator

Cao, Cheng Bo; Zhou, Chen; Sun, Xun; Gao, Jianmei; Wang, Zhi Yuan

doi:10.1016/j.polymer.2010.06.052

Cited by 9 publications

(4 citation statements)

References 23 publications

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“…As a PBG without gas generation, Wang and coworkers reported a bicyclic guanidinium tetraphenylborate that generates a strong organic base. However, it was difficult to chemically modify it to regulate the maximum absorption wavelength of the PBG.…”

Section: Methodsmentioning

confidence: 99%

Photobase generators derived from trans-o -coumaric acid for anionic UV curing systems without gas generation

Arimitsu

Takemori

Nakajima

et al. 2015

J. Polym. Sci. Part A: Polym. Chem.

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Section: Methodsmentioning

confidence: 99%

Photobase generators derived from trans-o -coumaric acid for anionic UV curing systems without gas generation

Arimitsu

Takemori

Nakajima

et al. 2015

J. Polym. Sci. Part A: Polym. Chem.

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“…240,241 This advancement allowed the creation of entirely homogeneous mixtures of monomers and TBD-HBP. 242,243 Upon UV exposure, TBD was uniformly activated throughout the network, enabling more efficient transesterification. [244][245][246] Subsequently, a photoinitiator responsive to visible LED light was developed, further expanding the range of processing options for vitrimer systems.…”

Section: Vitrimers and Latent Curingmentioning

confidence: 99%

“…In 2008, Wang and colleagues developed TBD‐tetraphenylborate (TBD‐HBP), a compound that releases TBD upon exposure to UV radiation (Scheme 71). 240,241 This advancement allowed the creation of entirely homogeneous mixtures of monomers and TBD‐HBP 242,243 . Upon UV exposure, TBD was uniformly activated throughout the network, enabling more efficient transesterification 244–246 .…”

Section: Tbd‐mediated Step‐growth Polymerizationmentioning

confidence: 99%

Triazabicyclodecene: A versatile catalyst for polymer synthesis

Kim,

Lee,

Lee

2023

Journal of Polymer Science

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This comprehensive review aims to provide an in‐depth analysis of the catalytic performance of 1,5,7‐triazabicyclo[4,4,0]dec‐5‐ene (TBD) in polymer synthesis. TBD, a well‐established organic superbase, possesses a distinctive bifunctional character that grants it exceptional capabilities, particularly in processes such as transesterification or transamidation. TBD has garnered considerable attention since its initial report by Hedrick and Waymouth in 2006, and it has played a pivotal role in diverse polymerization reactions. Its versatility spans various polymerization modes, including chain‐growth and step‐growth polymerization, post‐polymerization modification, and network thermoset formation. More recently, its utility has extended to the green chemical recycling of polymers. By providing an encompassing overview of TBD's historical journey, this review delves into its past accomplishments while shedding light on its present and future potential to organocatalysts in polymer science.

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“…Photosensitive polymers are indispensable for this process as photoresists to protect metal surfaces while being subjected to an etching process . To accomplish high photosensitivity, various chemical amplification systems have been developed in which photogenerated acid or base catalyses a chemical reaction in a resist film. While photosensitive materials based on base‐catalysed reactions have merit for preventing erosion of metallic substrates, photobase generators generally have low quantum yields, which leads to low photosensitivity.…”

Section: Introductionmentioning

confidence: 99%

Base-amplifying silicone resins with photobase-generating side chains and their application to negative-working photoresists

Furutani

Kobayashi

Gunji

et al. 2015

J. Polym. Sci. Part A: Polym. Chem.

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To accomplish high photosensitivity of resist systems including photobase generators, we have proposed the concept of base‐proliferation reactions that generate base molecules in a nonlinear manner by the action of a catalytic amount of base; however, excessive diffusion of generated base molecules is still a problem. We have designed novel functional silicone resins bearing both base‐amplifying units and photobase‐generating units, and synthesized resins with various composition ratios. The synthesized resins are decomposed autocatalytically after UV irradiation and subsequent heating at 100 °C, which indicates progression of base‐proliferation reactions. High photosensitivity (8.1 mJ cm−2) was recorded, and it was found that the photosensitivity is about 490 times enhanced by replacing a base‐catalytic reaction system with the base‐proliferation reaction system. Furthermore, a 4 × 10 µm line‐and‐space pattern has been successfully fabricated using the silicone resin. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 1205–1212

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Photo-induced crosslinking of water-soluble polymers with a new photobase generator

Cited by 9 publications

References 23 publications

Photobase generators derived from trans-o -coumaric acid for anionic UV curing systems without gas generation

Photobase generators derived from trans-o -coumaric acid for anionic UV curing systems without gas generation

Triazabicyclodecene: A versatile catalyst for polymer synthesis

Base-amplifying silicone resins with photobase-generating side chains and their application to negative-working photoresists

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