1963
DOI: 10.1016/0042-207x(63)90537-2
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Photo-electric measurement of the work function of metals and its alteration after gas adsorption

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1969
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Cited by 21 publications
(5 citation statements)
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“…The secondary electron energy distribution curve from a tantalum substrate is shown in Figure . For fast secondary electrons (SEs, E k ≥ 10 eV), the relative energy distribution was measured using an analytical X-ray photoelectron spectrometer (XPS, Perkin-Elmer) under UHV conditions; for slow SEs ( E k ≤ 10 eV), it was obtained from eq 1: normalη false( E normalk false) = normalη normals E normalk / false( E normalk + W false) 4 where η( E k ) is the yield of SEs having kinetic energy of E k , η s is the yield normalization coefficient, and W is the work function of tantalum (i.e., 4.3 ± 0.1 eV for a vacuum deposited film of tantalum and 4.22 ± 0.02 eV for the bulk substrate of tantalum). The electron energy distribution peaks at 1.4 eV, and the average energy is 5.85 eV.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The secondary electron energy distribution curve from a tantalum substrate is shown in Figure . For fast secondary electrons (SEs, E k ≥ 10 eV), the relative energy distribution was measured using an analytical X-ray photoelectron spectrometer (XPS, Perkin-Elmer) under UHV conditions; for slow SEs ( E k ≤ 10 eV), it was obtained from eq 1: normalη false( E normalk false) = normalη normals E normalk / false( E normalk + W false) 4 where η( E k ) is the yield of SEs having kinetic energy of E k , η s is the yield normalization coefficient, and W is the work function of tantalum (i.e., 4.3 ± 0.1 eV for a vacuum deposited film of tantalum and 4.22 ± 0.02 eV for the bulk substrate of tantalum). The electron energy distribution peaks at 1.4 eV, and the average energy is 5.85 eV.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…This effect corresponded to the mechanism of electronic sensitization. The electron work function φ for reduced palladium surface was smaller than in the case of PdO x and is φ = 4.8 eV [ 73 ], which was close to the work function for SnO 2 ( φ = 4.9 eV, [ 74 ]). Thus, as a result of the reduction of PdO x clusters, a barrier was removed at the Pd/SnO 2 interface, which led to a decrease in material resistance and the sensor response appearance.…”
Section: Resultsmentioning
confidence: 75%
“…In the case of a clean Pd surface, the work function increases by ca. 0.2V by hydrogen (11,12), 0.7-0.8V by carbon monoxide (13,14) and ca. 1.0V by oxygen (2,15).…”
Section: Resultsmentioning
confidence: 99%