Phosphorylation of Histone H2AX Generated by Linear Alkylbenzene Sulfonates and its Suppression by UVB Exposure

Abstract

We previously demonstrated that the nonionic surfactants, nonylphenol polyethoxylates (NPEOs) induced the phosphorylation of histone H2AX (γ-H2AX), accompanied by DNA double-strand breaks (DSBs), and that exposure to ultraviolet (UV) degraded NPEOs, which sometimes enhanced their DNA-damaging ability. In this study, we showed that linear alkylbenzene sulfonates (LAS), general anion surfactants, also generated DSBs with γ-H2AX, and this ability was attenuated by UVB exposure. In the human breast adenocarcinoma cell line, MCF-7, γ-H2AX was generated in a dose-dependent manner immediately after cells were treated with LAS, and this was attributed to the formation of DSBs and was independent of cell cycle phases. The ability to generate γ-H2AX was markedly reduced in LAS exposed to UVB. HPLC analysis revealed that LAS were a mixture of various alkyl chain lengths, the peaks of which were detected at individual retention times. UVB evenly decreased all peaks of LAS, without migration of peaks to other retention times, which indicated that UVB may degrade the benzene ring of LAS, but did not shorten the alkyl chains. UVB is an important environmental factor in the degradation of LAS exhibiting the ability to induce DSBs, the most serious type of DNA damage.

Evaluation of chemical phototoxicity, focusing on phosphorylated histone H2AX

“…Until now, we have proposed that γ-H2AX is useful for determining the genotoxicity of environmental chemicals, benzene metabolites, photooxidized polycyclic aromatic hydrocarbons (PAHs), detergents, and other substances [ – 7 , 55 , 56 ]. Similarly, γ-H2AX is a sensitive phototoxic marker for environmental chemicals [ 9 , 14 ].…”