The perfluorinated
silylphosphinidene, F3SiP, in the
triplet ground state is generated by the reaction of laser-ablated
silicon atoms with PF3 in solid neon and argon matrices.
The reactions proceed with the initial formation of a silicon trifluorophosphine
complex, F3PSi, in the triplet ground state, and a more
stable inserted phosphasilene, FPSiF2, in the singlet ground
state upon deposition. The trifluorosilylphosphinidene was formed
through F-migration reactions of FPSiF2 and F3PSi following a two-state mechanism under irradiation with visible
light (λ = 470 nm) and full arc light (λ > 220 nm),
respectively.
High-level quantum-chemical methods support the identification of
F3PSi, FPSiF2, and F3SiP by matrix-isolation
IR spectroscopy.