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1990
DOI: 10.1103/physrevb.42.7078
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Phonon-drag thermoelectric power inAlxGa1

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Cited by 9 publications
(3 citation statements)
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“…We note that, employing the unscreened form for the deformation potential with the appropriate parameter Ξ, good agreement between theory and experiments has been reached in a previous study on phonon-drag thermoelectric effect. 44 In our numerical calculations, the parameters are chosen as follows: κ = 12.9, d = 5.31 g/cm 3 , u sl = 5.29 × 10 3 m/s, u st = 2.48×10 3 m/s, Ξ = 8.5 eV, m * = 0.067m 0 (m 0 is free electron mass), e 14 = 1.41 × 10 9 V/m. Since we are interested in the temperature and electron-density dependencies of the diffusion and phonon-drag TEPs at low temperature (T ≤ 5 K), the relaxation of phonons due to phonon-phonon scattering can be ignored and only the temperature-independent boundary scattering need be considered.…”
Section: Resultsmentioning
confidence: 99%
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“…We note that, employing the unscreened form for the deformation potential with the appropriate parameter Ξ, good agreement between theory and experiments has been reached in a previous study on phonon-drag thermoelectric effect. 44 In our numerical calculations, the parameters are chosen as follows: κ = 12.9, d = 5.31 g/cm 3 , u sl = 5.29 × 10 3 m/s, u st = 2.48×10 3 m/s, Ξ = 8.5 eV, m * = 0.067m 0 (m 0 is free electron mass), e 14 = 1.41 × 10 9 V/m. Since we are interested in the temperature and electron-density dependencies of the diffusion and phonon-drag TEPs at low temperature (T ≤ 5 K), the relaxation of phonons due to phonon-phonon scattering can be ignored and only the temperature-independent boundary scattering need be considered.…”
Section: Resultsmentioning
confidence: 99%
“…with τ bs as the relaxation time due to boundary scattering, 1/τ bs = u Qλ /Λ, 44 and τ pp as the relaxation time due to phonon-phonon scattering, 1/τ pp = A λ T 3 Ω 2 Qλ . 67,68 ∂N Qλ ∂t ep is the phonon scattering rate due to the electron-phonon interaction, as given by…”
Section: A Electron and Phonon Boltzmann Equationsmentioning
confidence: 99%
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