2011
DOI: 10.1142/s0217984911027078
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PHONON-DRAG EFFECT OF ULTRA-THIN FeSi2 AND MnSi1.7/FeSi2 FILMS

Abstract: Phonon-drag effect usually occurs in single crystals at very low temperatures (10–200 K). Strong phonon-drag effect is observed in ultra-thin β- FeSi 2 films at around room temperature. The Seebeck coefficient of a 23 nm-thick β- FeSi 2 film can reach -1.375 mV/K at 343 K. However, the thermoelectric power factor of the film is still small, only 0.42×10-3 W/m-K2, due to its large electrical resistivity. When a 27 nm-thick MnSi 1.7 film with low electrical resistivity is grown on it, the thermoelectric power fa… Show more

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Cited by 6 publications
(3 citation statements)
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“…1). This type of size-dependent shift in the Seebeck peak is one of the characteristics of the phonon-drag dominated systems, as pointed out previously [18,19,20].…”
Section: Resultssupporting
confidence: 68%
“…1). This type of size-dependent shift in the Seebeck peak is one of the characteristics of the phonon-drag dominated systems, as pointed out previously [18,19,20].…”
Section: Resultssupporting
confidence: 68%
“…Similarly, the peak in the Seebeck coefficients for the flux-grown single crystal is also larger than the powder sample (prepared from the flux-grown sample) by a factor of ≈ 30. Such features have been observed in other semiconductors including single crystals of Ge, 59 Si 60 and CrSb 2 , 14 nano-composite FeSb 2 , 8 reduced TiO 2 , 61,62 ultra-thin films of FeSi 2 and MnSi 1.7 /FeSi 2 , 63 which have subsequently been demonstrated to arise from phonondrag effects. Phonon drag can be defined as the effect arising from a preferential scattering of the charge carriers by the phonons in the direction of the flow (i.e., the drag on the charge carriers exerted by the phonons streaming from hot to cold end in thermal conduction) and mostly evidenced at low temperatures.…”
Section: E Phonon-drag Mechanismmentioning
confidence: 70%
“…The addition of Si to the film was necessary to adjust the atomic ratio of Si to Fe to the desired value 2. The magnetron sputtering system can be found in detail in our previous reports 19,20 The base pressure of the sputtering vacuum chamber was 5.6 × 10 −4 Pa. The argon gas pressure during sputtering was 0.65 Pa.…”
Section: Introductionmentioning
confidence: 99%