2013
DOI: 10.1016/j.tsf.2013.04.071
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Phase transition of hydrogenated SiGe thin films in plasma-enhanced chemical vapor deposition

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Cited by 3 publications
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“…In this study, weak integrated intensity of c-Ge-Ge mode was ignored in the contribution of crystalline column fraction. To obtain a quantified value to compare the degree of crystallization, the was calculated by the ratio of ( + )/( + + ), where the integrated intensities of crystalline ( ), intermediate ( ), and amorphous ( ) Si phases in Raman spectra were used [16,25]. In the plasma of PECVD process, the generation of growth precursor is proportional to the density of energetic electrons which are responsible for the reaction and the dissociation cross section [26].…”
Section: Effect Of Rf Power On the Properties Of C-si 1−x Ge X :Hmentioning
confidence: 99%
“…In this study, weak integrated intensity of c-Ge-Ge mode was ignored in the contribution of crystalline column fraction. To obtain a quantified value to compare the degree of crystallization, the was calculated by the ratio of ( + )/( + + ), where the integrated intensities of crystalline ( ), intermediate ( ), and amorphous ( ) Si phases in Raman spectra were used [16,25]. In the plasma of PECVD process, the generation of growth precursor is proportional to the density of energetic electrons which are responsible for the reaction and the dissociation cross section [26].…”
Section: Effect Of Rf Power On the Properties Of C-si 1−x Ge X :Hmentioning
confidence: 99%