2005
DOI: 10.2109/jcersj.113.280
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Phase Transformation of Titania Domains in the Titania/PDMS Hybrid Particles by Heat Treatment

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Cited by 1 publication
(2 citation statements)
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“…PDMS is widely used as a precursor for the silica layer, and the surface of PDMS can be converted to silicon oxide by various techniques such as low-temperature plasma oxidation, 18 UV/ozone treatment, [19][20][21] and pyrolytic degradation. 22,23 Recently, different three-dimensional structures of semiconductor, metal, and polymer have been fabricated using strain-driven self-rolling technique. [24][25][26][27][28][29][30] The strain in the film can arise by unequal thermal expansion of top and bottom layer, 31 different crystal lattice constants of top and bottom layer, [26][27][28][29] or unequal swelling of film in selective solvent.…”
Section: Introductionmentioning
confidence: 99%
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“…PDMS is widely used as a precursor for the silica layer, and the surface of PDMS can be converted to silicon oxide by various techniques such as low-temperature plasma oxidation, 18 UV/ozone treatment, [19][20][21] and pyrolytic degradation. 22,23 Recently, different three-dimensional structures of semiconductor, metal, and polymer have been fabricated using strain-driven self-rolling technique. [24][25][26][27][28][29][30] The strain in the film can arise by unequal thermal expansion of top and bottom layer, 31 different crystal lattice constants of top and bottom layer, [26][27][28][29] or unequal swelling of film in selective solvent.…”
Section: Introductionmentioning
confidence: 99%
“…Here, we used poly(dimethylsiloxane) (PDMS) as a precursor of silica. PDMS is widely used as a precursor for the silica layer, and the surface of PDMS can be converted to silicon oxide by various techniques such as low-temperature plasma oxidation, UV/ozone treatment, and pyrolytic degradation. , …”
Section: Introductionmentioning
confidence: 99%