Phase-shift focus monitor applications to lithography tool control

Wheeler, Donald C.; Solecky, Eric; Dinh, Thanh-Hung; Mih, R.

doi:10.1117/12.275968

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Multiple Phase-phase Shift Mask (Mp-psm)1

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2005

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“…All the techniques of measuring defocus by pattern shift use this phenomenon 4,5 . In order to induce chief lay tilted, the PSFM used 0 and 90 degrees phase shifters, and the PGFM employed phase gratings, alternating between 0 and 90 degrees phase.…”

Section: Multiple Phase-phase Shift Mask (Mp-psm)mentioning

confidence: 99%

Influence of material on process focus budget and process window of 80nm DRAM devices

et al. 2005

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A new type of focus monitoring mask, multiple phase-phase shift mask (MP-PSM), has been designed, and the focus budget of a lithography process was investigated. MP-PSM was used to identity focus controllability of several scanners and was able to detect focus change smaller then 20 nm. We also investigated the difference in focus variation across a wafer between double side polished wafers and single side polished wafers. A comparative study of focus controllability of a scanner using 80 nm node DRAM pattern showed that the focus controllability of a scanner was directly affected by wafer type. Using double side polished wafers increased the process window.

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Section: Multiple Phase-phase Shift Mask (Mp-psm)mentioning

confidence: 99%