1998
DOI: 10.1063/1.121166
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Phase separation in InGaN/GaN multiple quantum wells

Abstract: Evidence is presented for phase separation in In0.27Ga0.73N/GaN multiple quantum wells. After annealing for 40 h at a temperature of 950 °C, the absorption threshold at 2.95 eV is replaced by a broad peak at 2.65 eV. This peak is attributed to the formation of In-rich InGaN phases in the active region. X-ray diffraction measurements show a shift in the diffraction peaks toward GaN, consistent with the formation of an In-poor phase. A diffraction peak corresponding to an In-rich phase is also present in the ann… Show more

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Cited by 195 publications
(147 citation statements)
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“…Fluctuations on this length scale have indeed been observed in experiments [12] and have been shown to dramatically enhance the luminescence efficiency [1]. Although bulk phase separation in InGaN has been observed at relatively high temperatures or for thick films [13], the observed effects in thin InGaN quantum wells appear to have different origin. If the bulk In concentration is roughly proportional to the layer 2 In concentration, then the surface reconstruc- tion established here provides a new mechanism to produce variations in the bulk In concentration on a nanometer scale.…”
Section: (Received 20 April 2000)mentioning
confidence: 77%
“…Fluctuations on this length scale have indeed been observed in experiments [12] and have been shown to dramatically enhance the luminescence efficiency [1]. Although bulk phase separation in InGaN has been observed at relatively high temperatures or for thick films [13], the observed effects in thin InGaN quantum wells appear to have different origin. If the bulk In concentration is roughly proportional to the layer 2 In concentration, then the surface reconstruc- tion established here provides a new mechanism to produce variations in the bulk In concentration on a nanometer scale.…”
Section: (Received 20 April 2000)mentioning
confidence: 77%
“…During the whole procedure, the beam angle was set at 5° for the two guns. Prior to analytical TEM by EDXS and EELS, conventional TEM investigations were performed by high resolution TEM using a JEOL 2010 microscope, for defect investigation in order to determine the strain relaxation mechanisms in these layers which may involve the formation of typical defects such as dislocations [6,7,8], stacking faults [9,10,11] and, in the worst cases, inversion domains [12,13] as well as phase ordering and phase separation [14,15].…”
Section: In X Ga 1-x N Thin Film Growthmentioning
confidence: 99%
“…Evidence for these fluctuations has been reported recently for thick In x , Ga1-x Ν films [5] as well as for quantum well structures [6]. As the decomposition of InN starts at approximately 630°C whereas GaN is stable up to 850°C [7] loss of In from the film during growth may occur due to the thermal dissociation of In-N bonds.…”
Section: )mentioning
confidence: 98%