Abstract:We have studied a method to realize an optical spatial filter applicable to inspection systems for patterned silicon wafers by means of a phase-modulation filter. A simulated-annealing method can be used to design a one-dimensional binary phase spatial filter which effectively levels a periodic pattern corresponding to memory cells and so on. The optimum cost function is the maximum optical amplitude on the observation plane of the inspection system. The suitable binary phase ranges from 0.7π to 1.3π . Further… Show more
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