Phase formation, structure, and state of stress of nanostructured tantalum boride films

10.1007/s11451-008-1030-3

“…The same texture was previously observed by many researchers for virtually all the films synthesized from transition metal diborides, such as the TiB 2 [1,2,7], CrB 2 [4,5,9], TaB 2 [12][13][14], and VB 2 [15] diborides and the TiB 2 -W 2 B 5 quasi-binary system [16][17][18].…”

“…This leads to a shift of the diffraction maxima, thus indicating the deviation of the composition of the phase under investigation from the stoichiometric composition. The above situation occurs upon the formation of tantalum diboride films and is described in detail in [12,13].…”

“…The technique used for preparing films and the results of detailed investigations into the formation of the structure, composition, and properties of film materials were described in our previous papers [12][13][14].…”

Hard and electrically conductive multicomponent diboride-based films with high thermal stability

“…σ up to 10.5 GPa in Ref. [24]). The figure also quantifies the full width at half maximum (FWHM) of the main XRD peak (surface plane (0001)), indicating (despite the contribution of microstrain) decreasing crystal size when the number of metal elements increases from 2-3 to 5.…”

“…However, there are open questions resulting from the following. First, one of the difficulties in the field of deposition of heavy metal diborides such as HfB 2 or TaB 2 is very high compressive stress (up to 10.5 GPa) [24][25][26] and the resulting delamination of films [27]. A case can be made that this high compressive stress has largely limited the number of studies on HfB 2 and TaB 2 thin films, despite the fact that their high-temperature bulk properties outperform those of other diborides [5].…”