1974
DOI: 10.1149/1.2401931
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Phase Equilibria and Vapor Pressures of Pure Phosphorus and of the Indium/Phosphorus System and Their Implications Regarding Crystal Growth of InP

Abstract: The vapor pressure as a function of temperature of several commercial grades of red phosphorus and a specially prepared crystalline sample has been measured. For crystalline red P we obtain a heat of sublimation, δHs=31.9±1 normalkcal/normalmole . The commercial grades yield vapor pressures, which above 450°C are described by the equation In p=−false(10.8±0.4false)×103/T+false(16.5±0.6false) . The sublimation equilibrium of red P can be utilized for controlling phosphorus pressures, p>10 normalatm , with a … Show more

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Cited by 110 publications
(22 citation statements)
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“…For processing thin films by phosphidation, we chose a phosphorus source with two phases, Sn and Sn 4 P 3 , because of the difficulties in controlling phosphorus vapor pressure from red phosphorus [11]. The molar ratio of Sn/Sn 4 P 3 was set at about 3, which corresponds to 30 at.% P in the Sn-P binary system, and the total amount was about 2 g. The phosphorus gas was transported to Zn-Sn thin films using Ar carrier gas and the partial pressure of phosphorus was controlled by heating temperature of the phosphorus source.…”
Section: Phosphidation Of Zn-sn Thin Filmsmentioning
confidence: 99%
“…For processing thin films by phosphidation, we chose a phosphorus source with two phases, Sn and Sn 4 P 3 , because of the difficulties in controlling phosphorus vapor pressure from red phosphorus [11]. The molar ratio of Sn/Sn 4 P 3 was set at about 3, which corresponds to 30 at.% P in the Sn-P binary system, and the total amount was about 2 g. The phosphorus gas was transported to Zn-Sn thin films using Ar carrier gas and the partial pressure of phosphorus was controlled by heating temperature of the phosphorus source.…”
Section: Phosphidation Of Zn-sn Thin Filmsmentioning
confidence: 99%
“…Boron oxide (B2O3) is usually used to overcome this problem [11][12][13]. In the case of gallium arsenide (GaAs), gallium phosphide (GaP) and indium phosphide (InP), arsenic and phosphor have high vapor pressure.…”
Section: Bridgman Methodsmentioning
confidence: 99%
“…Boron oxide (B2O3) is usually used to overcome this problem [11][12][13]. The furnace contains a crystal (1), melt (2), a crucible (3,4), pedestals (5,6), thermal shields (7-10) and heaters (11)(12)(13). Therefore, it is easy to remove a grown crystal from the crucible without mechanical breakage of the crystal and crucible.…”
Section: Bridgman Methodsmentioning
confidence: 99%
“…Prior to seal off, the ampoule was The electronic properties of several of the crystals were measured. The room-temperature mobilities were in the range from 2500 to 3300 cm 2 /volt-sec, with carrier concentrations in the low-to-mid 101 6 /cm 3 range. All of the material was n-type as grown.…”
Section: Synthesis and Growth Techniquementioning
confidence: 96%