Phase composition, structural, and plasma erosion properties of ceramic coating prepared by suspension plasma spraying

Abstract

Y3Al5O12 (YAG), Y2O3, and Al2O3 ceramic coatings were manufactured to investigate the plasma erosion properties. The X‐Ray Diffraction (XRD) analysis confirmed that YAG coating was synthesized successfully by Y2O3 and Al2O3 mixture suspension using the plasma spraying method. Meanwhile, metastable phases were found in Y2O3 and Al2O3 coatings due to the quenching in cooling process of melted droplets. The coating surface morphology and microstructure of cross sections were characterized by SEM. The results reveal that coatings are composed by ultrafine splats and exhibit dense lamellar structure. The plasma erosion properties were evaluated at different etching test power under Ar/CF4/O2 plasma gas. The experimental results clarify that both of YAG and Y2O3 coatings show the better plasma erosion resistance than Al2O3 coatings. The formation of fluorination layer surface prevents the coatings from further erosion with plasma gas. Moreover, the etching rate of coatings depended on the fluorination and removing rate of fluoride layer.

Plasma etching behavior of yttrium‐aluminum oxide composite ceramics

“…Thus Al 2 O 3 was more easily etched under the same etching conditions. According to the studies, 12,13,15 the Y‐F bond corresponds to YF 3, and the Al‐F bond corresponds to AlF 3 . The boiling temperature of YF 3 is 2230°C, and its sublimation enthalpy is 481 ± 21 kJ·mol –1 , whereas the corresponding values for AlF 3 are 1250°C and 301 ± kJ·mol –1 , respectively.…”

“…Kim 11 studied the erosion behavior of YAG under fluorine plasma and advocated that the excess addition of Al 2 O 3 or Y 2 O 3 into stoichiometric YAG produced a secondary phase of Al 2 O 3 or YAlO 3 , respectively; however, the overall erosion rate was not sensitive to the excess addition of Al 2 O 3 or Y 2 O 3 . Zhao 12 studied the plasma etching properties of YAG, Y 2 O 3 , and Al 2 O 3 ceramic coatings and asserted that both YAG and Y 2 O 3 coatings had better plasma resistance than the Al 2 O 3 coating and the erosion rate depended on fluorination and the removal rate of fluoride layers. Kim 13 studied the interaction of yttrium‐aluminum oxide with fluorine‐based plasma and noticed that the etching rate of the Al 2 O 3 ‐Y 2 O 3 system first decreased abruptly and then changed slowly with the increase in the yttria content.…”

Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y2O3 and YF3 Coatings under NF3 Plasma

“…Another advantage is that NF 3 is almost fully dissociated in the discharge, which results in a high etching rate [11][12][13][14]. The erosion behaviors of Y 2 O 3 , YOF, and YF 3 coatings in CF 4 /O 2 /Ar plasmas have been reported in previous works [15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33][34]. However, there have been no studies on the corrosion behavior of the yttrium-based materials or contamination particles generated from them in NF 3 plasmas.…”

Remarkable plasma-resistance performance by nanocrystalline Y2O3·MgO composite ceramics for semiconductor industry applications

“…However, Y 2 O 3 ceramic suffers from unnecessary grain growth at high temperature 15 , making Y 2 O 3 a challenging system to obtain grain size in the sub-micron range-the coarser grain size results in poor mechanical property. The plasma resistance in ceramic is associated with the porosity, roughness, defect density, and mechanical property 8,16 . Therefore, it is imperative to develop a system having a near theoretical density, fine grain size, low roughness, and high strength.…”