Petri net-based scheduling analysis of dual-arm cluster tools with wafer revisiting

Abstract

With wafer revisit, it is complicated to schedule cluster tools in semiconductor fabrication. In wafer fabrication processes, such as atomic layer deposition (ALD), the wafers need to visit some process modules for a number of times. The existing swap-based strategy can be used to operate a dual-arm cluster tool for such a process. It results in a 3-wafer cyclic schedule. However, it is not optimal in the sense of cycle time. Thus, to search for a better schedule, a Petri net model is developed for a dual-arm cluster tool with wafer revisit. With it, the properties of the 3-wafer schedule are analyzed. It is found that, to improve the performance, it is necessary to reduce the number of wafers completed in a cycle. Thus, a 1-wafer schedule is developed by using a new swap-based strategy.