2023
DOI: 10.1016/j.matt.2022.09.029
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Persistent hot carrier diffusion in boron arsenide single crystals imaged by ultrafast electron microscopy

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Cited by 10 publications
(3 citation statements)
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“…\left(\mu\right)_{\text{e}} + \left(\mu\right)_{\text{h}} \left.\right)$ of 1600 cm 2 V −1 s −1 , and κRT$\left(\kappa\right)_{\text{RT}}$ of 1200 Wm −1 K −1 . Recent works by Yue et al [ 7 ] and Choudhry et al [ 8 ] also establish these facts from transient reflectivity microscopy and ultrafast electron microscopy, respectively. These observations make cubic BAs an attractive candidate for next‐generation semiconductor‐based technologies.…”
Section: Introductionmentioning
confidence: 61%
See 1 more Smart Citation
“…\left(\mu\right)_{\text{e}} + \left(\mu\right)_{\text{h}} \left.\right)$ of 1600 cm 2 V −1 s −1 , and κRT$\left(\kappa\right)_{\text{RT}}$ of 1200 Wm −1 K −1 . Recent works by Yue et al [ 7 ] and Choudhry et al [ 8 ] also establish these facts from transient reflectivity microscopy and ultrafast electron microscopy, respectively. These observations make cubic BAs an attractive candidate for next‐generation semiconductor‐based technologies.…”
Section: Introductionmentioning
confidence: 61%
“…With that they found μ h > 1000 cm 2 V À1 s À1 , ambipolar mobility 2μ e μ h =ðμ e þ μ h Þ of 1600 cm 2 V À1 s À1 , and κ RT of 1200 Wm À1 K À1 . Recent works by Yue et al [7] and Choudhry et al [8] also establish these facts from transient reflectivity microscopy and ultrafast electron microscopy, respectively. These observations make cubic BAs an attractive candidate for next-generation semiconductorbased technologies.…”
Section: Introductionmentioning
confidence: 65%
“…Whereas for rightward diffusion, we obtained a constant of D = 2510 ± 165 cm 2 s −1 and D = 69 ± 6 cm 2 s −1 for hot and relaxed carriers, respectively. [40][41][42][43] Note that the difference between the right and left maximum diffused distances is approximately 5 µm (For more details see Figures S5-S8, Supporting Information). The occurrence of charge diffusion along a preferred direction rather than being uniform was likely due to its dependence on the morphology and roughness of the surface near the excited area and defect centers around the laser footprint.…”
Section: Resultsmentioning
confidence: 99%