2018
DOI: 10.5487/tr.2018.34.2.111
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Permitted Daily Exposure for Diisopropyl Ether as a Residual Solvent in Pharmaceuticals

Abstract: Solvents can be used in the manufacture of medicinal products provided their residual levels in the final product comply with the acceptable limits based on safety data. At worldwide level, these limits are set by the “Guideline Q3C (R6) on impurities: guideline for residual solvents” issued by the ICH. Diisopropyl ether (DIPE) is a widely used solvent but the possibility of using it in the pharmaceutical manufacture is uncertain because the ICH Q3C guideline includes it in the group of solvents for which “no … Show more

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Cited by 5 publications
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References 26 publications
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