1998
DOI: 10.1016/s0925-4005(98)00219-6
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Periodically structured metallic substrates for SERS

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Cited by 290 publications
(211 citation statements)
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“…These benefit from multiple hot spots being generated in a uniform fashion over a larger substrate area generating high signal enhancement 22 throughout the entire substrate. Various methods exist to fabricate such structures including lithographic 18,23,24 and chemical approaches 19 . Metallic structures can also be fabricated from self assembled non-metallic scaffolds 25 .…”
Section: Introductionmentioning
confidence: 99%
“…These benefit from multiple hot spots being generated in a uniform fashion over a larger substrate area generating high signal enhancement 22 throughout the entire substrate. Various methods exist to fabricate such structures including lithographic 18,23,24 and chemical approaches 19 . Metallic structures can also be fabricated from self assembled non-metallic scaffolds 25 .…”
Section: Introductionmentioning
confidence: 99%
“…Analytical solutions for the fields are known only for particles with a very simple shape, like that of a sphere or an ellipsoid, [27][28][29][30][31][32][33][34][35] or spherical shells and periodic cylinder gratings. [36][37][38][39][40][41][42][43][44] While electrostatic methods can provide some level of insight, 45 complete electromagnetic solvers are needed to obtain accurate results. Many groups have developed methods of solving Maxwell's equations to investigate nonregular plasmon resonant particles in the 100-200 nm size range; [46][47][48] however, although particles of this size provide large SCS's at the plasmon resonance, the resonances are very broad and the field enhancement in the vicinity of the particles is relatively small.…”
Section: Introductionmentioning
confidence: 99%
“…For instance, while photolithography [ 6 ] is a fl exible method for generating optical patterns, it is limited by the optical diffraction limit and is essentially 2D, meaning that many steps must be iterated to create a 3D structure. Electron beam lithography is an alternative approach that uses a scanning beam of electrons [ 7 ] to write sub-micrometer structures into a resist that can subsequently be transferred to the substrate material, often by etching. The preparation of such patterns not only requires sequential writing steps, but is also vulnerable to beam drift or instability which may occur during the long exposure times.…”
Section: Introductionmentioning
confidence: 99%