Periodic Large‐Area Metallic Split‐Ring Resonator Metamaterial Fabrication Based on Shadow Nanosphere Lithography

Gwinner, Michael C.; Koroknay, Elisabeth; Fu, Liwei; Patoka, Piotr; Kandulski, Witold; Giersig, Michael; Gießen, Harald

doi:10.1002/smll.200800923

Cited by 164 publications

(134 citation statements)

References 22 publications

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“…Arrays nanoscale crescents [136,252] can be constructed using nonclose-packed monolayers, the preparation of which has been introduced in chapter 5.2.2. Such objects are of special interest as they support several multipolar resonances [129][130]148] and can be described as nanoscale split ring resonators.…”

Section: Introductionmentioning

confidence: 99%

Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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This thesis focuses on the controlled assembly of monodisperse polymer colloids into ordered two-dimensional arrangements. These assemblies, commonly referred to as colloidal monolayers, are subsequently used as masks for the generation of arrays of complex metal nanostructures on solid substrates.The motivation of the research presented here is twofold. First, monolayer crystallization methods were developed to simplify the assembly of colloids and to produce more complex arrangements of colloids in a precise way. Second, various approaches to colloidal lithography are designed with the aim to include novel features or functions to arrays of metal nanostructures.The air/water interface was exploited for the crystallization of colloidal monolayer architectures as it combines a two-dimensional confinement with a high lateral mobility of the colloids that is beneficial for the creation of high long range order. A direct assembly of colloids is presented that provides a cheap, fast and conceptually simple methodology for the preparation of ordered colloidal monolayers. The produced two-dimensional crystals can be transformed into nonclose-packed architectures by a plasma-induced size reduction step, thus providing valuable masks for more sophisticated lithographic processes. Finally, the controlled co-assembly of binary colloidal crystals with defined stoichiometries on a Langmuir trough is introduced and characterized with respect to accessible configurations and size ratios.Several approaches to lithography are presented that aim at introducing different features to colloidal lithography. First, using metal-complex containing latex particles, the synthesis of which is described as well, symmetric arrays of metal nanoparticles can be created by controlled combustion of the organic material of the colloids. The process does not feature an inherent limit in nanoparticle size and is able to produce complex materials as will be demonstrated for FePt alloy particles. Precise control over both size and spacing of the particle array is presented.Second, two lithographic processes are introduced to create sophisticated nanoparticle dimer units consisting of two crescent shaped nanostructures in close proximity; essentially by using a single colloid as mask to generate two structures simultaneously. Strong coupling processes of the parental plasmon resonances of the two objects are observed that are accompanied by high near-field enhancements. A plasmon hybridization model is elaborated to explain all polarization dependent shifts of the resonance positions. Last, a technique to produce laterally patterned, ultra-flat substrates without surface topographies by embedding gold nanoparticles in a silicon dioxide matrix is applied to construct robust and re-usable sensing architectures and to introduce an approach for the nanoscale patterning of solid supported lipid bilayer membranes.

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Section: Introductionmentioning

confidence: 99%

Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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“…Kirakosian et al(Kirakosian et al, 2001) who demonstrated an atom-accurate silicon grating with period 5.73 nm, or exactly 17 atoms, by means of a Si(577) surface: notice that a grating of parallel lines is one of the most frequent test for patterning methods and an insidious one for lithography, since chemical etching suffers from capillarity when it comes to penetrating nanometer-narrow channels. Finally, the self-assembly properties of monodisperse spheres were also exploited to demonstrate shadow nanosphere lithography (NSL) that allow the fabrication of periodic arrays with morphologies ranging from cups to rods and wires by simply changing the substrate position with respect to the evaporation source (Kosiorek et al, 2005;Imperia et al, 2008;Gwinner et al, 2009). …”

Section: Other Patterning Methods Based On Self Assemblymentioning

confidence: 99%

Nanofabrication for Molecular Scale Devices

Kumar¹,

Karmakar²,

Bramanti³

et al. 2011

Nanofabrication

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“…Applications such as optical filters, [120,121] substrates for surface-enhanced Raman spectroscopy, [8,123] and metamaterials [128,130,133,137] required two-dimensional arrays of nanostructures. Using a procedure that combined replica molding of a nanostructured template (for example, a set of nanorods) in epoxy by soft lithography, thin-film deposition of metal onto those rods, embedding, and sectioning parallel to the plane supporting the nanorods, we produced two-dimensional arrays of nanostructures using nanoskiving.…”

Section: Fabrication Of 2d Arrays Of Nanostructuresmentioning

confidence: 99%

“…[66,135] Nanosphere lithography, pioneered by Van Duyne and coworkers, uses self-assembled spheres as a stencil mask, in which the void spaces between the spheres direct the deposition of metal on the substrate by evaporation. [136,137] Rogers, Odom, Nuzzo, and coworkers have used soft lithographic techniques, such as patterning photoresists with conformal phase-shifting masks, [138] as well as soft nanoimprint lithography, [139] to form arrays of nanoholes in metallic films [140] and pyramidal shells. [141] This section describes the use of nanoskiving to generate nanostructures for a variety of optical applications.…”

Section: Introductionmentioning

confidence: 99%

Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications

2011

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Lead-InThis paper reviews nanoskiving-a simple and inexpensive method of nanofabrication, which minimizes requirements for access to cleanrooms and associated facilities, and which make it possible to fabricate nanostructures from materials, and of geometries, to which more familiar methods of nanofabrication are not applicable. Nanoskiving requires three steps: i) deposition of a metallic, semiconducting, ceramic, or polymeric thin film onto an epoxy substrate; ii) embedding this film in epoxy, to form an epoxy block, with the film as an inclusion; and iii) sectioning the epoxy block into slabs with an ultramicrotome. These slabs, which can be 30 nm -10 µm thick, contain nanostructures whose lateral dimensions are equal to the thicknesses of the embedded thin films. Electronic applications of structures produced by this method include nanoelectrodes for electrochemistry, chemoresistive nanowires, and 4 heterostructures of organic semiconductors. Optical applications include surface plasmon resonators, plasmonic waveguides, and frequency-selective surfaces.

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Periodic Large‐Area Metallic Split‐Ring Resonator Metamaterial Fabrication Based on Shadow Nanosphere Lithography

Cited by 164 publications

References 22 publications

Surface Patterning with Colloidal Monolayers

Surface Patterning with Colloidal Monolayers

Nanofabrication for Molecular Scale Devices

Use of Thin Sectioning (Nanoskiving) to Fabricate Nanostructures for Electronic and Optical Applications

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