2002
DOI: 10.1016/s0042-207x(01)00323-2
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Performances presented by zinc oxide thin films deposited by r.f. magnetron sputtering

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Cited by 123 publications
(48 citation statements)
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“…25 For the Sp rf films, T s were fixed at room temperature and the deposition pressure varied between 1.06 and 2.93 Pa, using the procedure described elsewhere. 26 All sputtered films had thicknesses measured by the stylus method of about 200 nm, except the films deposited by SP which, in some cases, had thicknesses of about 2 m.…”
Section: Methodsmentioning
confidence: 99%
“…25 For the Sp rf films, T s were fixed at room temperature and the deposition pressure varied between 1.06 and 2.93 Pa, using the procedure described elsewhere. 26 All sputtered films had thicknesses measured by the stylus method of about 200 nm, except the films deposited by SP which, in some cases, had thicknesses of about 2 m.…”
Section: Methodsmentioning
confidence: 99%
“…Therefore, one of the causes of decrement of mobility with increasing the gas flow rate may be ascribed to the decrease in grain size, namely the increase in the grain boundary area i.e., the scattering center for carriers. In the ZnO thin films, oxygen atoms adsorbed by the surface of crystallites trap electrons and decrease the carrier concentration and also decrease the carrier mobility by increasing the potential height at the surface of crystallites [17]. On the other hand, as mentioned above, the decrease in grain size increases the effective surface area and then causes the increase in the number of adsorption site for oxygen [18].…”
Section: The Structure and Electrical Propertiesmentioning
confidence: 96%
“…This could be useful for efficient UV laser applications based on stimulated emissions due to the recombination of excitons at room temperature. With the aim to improve the performance of these films several deposition techniques have been developed and studied such as ion beam assisted deposition [9], chemical vapor deposition [10], spray pyrolysis [11], sol-gel [12] and magnetron sputtering [13]. RF-magnetron sputtering is widely used due to its reproducibility and efficiency; it is a physical technique in which the most important deposition parameters are deposition pressure, gas flux, RF-power and the distance between the target and the substrate, which should be well determined and controlled in order to obtain thin films with desired properties.…”
Section: Introductionmentioning
confidence: 99%
“…Also various biological, chemical and gas sensors [9] are based on ZnO thin film. Thin films of ZnNiO can be prepared by various techniques; among them are sputtering [10]- [11], metal-organic chemical vapour deposition (MOCVD) [12], pulse laser deposition (PLD) [13], spray pyrolysis [14] and sol-gel method [15]- [19] have studied structural and optical properties of nano crystalline ZnNiO thin films derived from clear emulation of nano-crystallite Ni doped ZnO nano crystals. Compare to the other processes, the sol-gel process has the advantages of control ability of chemical compositions due to its simplicity in processing and cost effective.…”
Section: Intrductionmentioning
confidence: 99%