Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications

Klerk, Jos de; Jorritsma, L.C.; Setten, Eelco van; Droste, Richard; Jongh, Richard du Croo de; Hansen, Steven G.; Smith, Delia E.; Kerkhof, Mark van de; Mast, Frank van de; Graeupner, Paul; Rohe, Thomas; Kornitzer, K.

doi:10.1117/12.485372

SPIE Proceedings

2003

DOI: 10.1117/12.485372

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Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications

Jos de Klerk

L.C. Jorritsma

Eelco van Setten

et al.

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Performance of a high-NA dual-stage 193-nm TWINSCAN Step and Scan system for 80-nm applications

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