1994
DOI: 10.1109/55.285372
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Performance limiting micropipe defects in silicon carbide wafers

Abstract: Abstract-We report on the characteristics of a major defect in mass-produced silicon carbide wafers which severely limits the performance of silicon carbide power devices. Micropipe defects originating in 4H-and 6H-Sic substrates were found to cause preavalanche reverse-bias point failures in most epitaxially-grown pn junction devices of 1 mm2 or larger in area. Until such defects are significantly reduced from their present density (on the order of 100's of micropipedcm'), silicon carbide power device ratings… Show more

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Cited by 286 publications
(119 citation statements)
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“…The micropipe is well-documented as the most harmful defect to 4H-and 6H-SiC power device performance [6]. As discussed in References [7][8][9][10], micropipes are hollow-core screw dislocations with Burgers vectors ≥ 2c formed during the SiC sublimation wafer growth process.…”
Section: Introductionmentioning
confidence: 99%
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“…The micropipe is well-documented as the most harmful defect to 4H-and 6H-SiC power device performance [6]. As discussed in References [7][8][9][10], micropipes are hollow-core screw dislocations with Burgers vectors ≥ 2c formed during the SiC sublimation wafer growth process.…”
Section: Introductionmentioning
confidence: 99%
“…Because of the non-terminating behavior of screw dislocations, both hollowcore and non-hollow-core screw dislocations and associated crystal lattice stresses are replicated in subsequently grown SiC epilayers [11,12]. Micropipe defects cause premature breakdown pointfailures in SiC high-field devices fabricated in 4H-and 6H-SiC c-axis crystals with and without epilayers [6]. To date the high density of micropipe defects has prevented the simultaneous realization of high-voltage SiC devices with sufficient areas to carry high on-state currents.…”
Section: Introductionmentioning
confidence: 99%
“…which lies somewhat below the theoretical calculation (2). Silicon experimental studies also indicate that pulse shape does not significantly change experimental device failure power densities, so that average power density may be used as a good approximation when diode voltage and/or current waveforrns are non-constant over the pulse duration [14].…”
mentioning
confidence: 96%
“…For example, the micropipes increase leakage current and reduce the breakdown voltage of SiC devices (Neudeck & Powell, 1994;Wahab et al, 2000). All the samples used in this section were 6H-SiC wafers grown by sublimation method.…”
Section: Characterizationsmentioning
confidence: 99%