2001
DOI: 10.1016/s0011-2275(01)00146-1
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Performance improvement of a pulse tube cooler below 4 K by use of GdAlO3 regenerator material

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Cited by 35 publications
(17 citation statements)
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“…More details of this cooler are given in [3,8,9]. The cooler is driven by a GM-type helium compressor (Leybold CP 6000) with nominal input power of 6 kW.…”
Section: Methodsmentioning
confidence: 99%
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“…More details of this cooler are given in [3,8,9]. The cooler is driven by a GM-type helium compressor (Leybold CP 6000) with nominal input power of 6 kW.…”
Section: Methodsmentioning
confidence: 99%
“…For operation near 4 K it is impractical to employ normal metals for this purpose since the volumetric specific heat of helium greatly exceeds that of normal metals at liquid helium temperatures. Rare-earth based magnetic intermetallic compounds [4,5] or ceramics [6] with high volumetric specific heat near 4 K have been successfully used as matrix material in the coldest regenerator of 4 K GM-coolers and pulse tube coolers [7][8][9]. In this paper, we propose to employ such magnetic regenerator materials for the damping of temperature oscillations.…”
Section: Introductionmentioning
confidence: 99%
“…The most important requirement for the regenerator materials are large specific heat around the working temperatures. To improve the efficiency, the researchers and engineers are seeking advanced regenerator materials [1][2][3][4] We have reported rare earth nitrides (ErN, HoN, DyN, TbN and GdN) have large specific heat at cryogenic temperatures [5,6]. Among them, ErN shows a peak of specific heat at 4 K. Thus, ErN was expected to be suitable materials for second stage regenerator of 4 K GM cryocoolers.…”
Section: Introductionmentioning
confidence: 99%
“…The most important requirement for the regenerator materials are large specific heat around the working temperatures. To improve the efficiency, the researchers and engineers are seeking advanced regenerator materials [1][2][3][4]. …”
mentioning
confidence: 99%
“…Usually, these oxides present low Neel temperatures (about 4 K) [3], high melting points (higher than 2400 K) [4], excellent crystal quality [5], and stability under chemical attack [6], making them appropriate and desired to applications as substrates for the epitaxial growth of thin films. Indeed, several works reported the features of thin films grown on, mainly, LaAlO 3 and NdAlO 3 substrates [7,8]. In all cases, there is a role of these substrates in the strain-induced properties.…”
Section: Introductionmentioning
confidence: 99%