2014
DOI: 10.1166/jolpe.2014.1348
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Performance Improvement in Nanoscale Ge–GaAs Heterojunction Junctionless Tunnel FET Using a Dual Material Gate

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“…19. In recent years good performing Ge planar devices, [20][21][22] FinFETs, [23][24][25] Gate-All-Around 26 and TFETs [27][28][29] have been demonstrated by different groups (see e.g. Ref.…”
mentioning
confidence: 99%
“…19. In recent years good performing Ge planar devices, [20][21][22] FinFETs, [23][24][25] Gate-All-Around 26 and TFETs [27][28][29] have been demonstrated by different groups (see e.g. Ref.…”
mentioning
confidence: 99%