Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography

Jaramillo, Janeth Hernández; Zarzycki, Artur; Galeano, July; Sandoz, Patrick

doi:10.3390/s17020278

Cited by 8 publications

(3 citation statements)

References 26 publications

(34 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Foroosh et al [15] proposed a phase correlation method on downsampled images using a Sinc function to approximate the Dirac Delta function in the frequency domain, which has less computation complexity but limited registration accuracy (0.05 pixel resolution) compared to the conventional FFT method. Guelpa et al and Jaramillo et al [29,30] demonstrated different vision measurement methods to sense 1D and 2D displacements. Subpixelic performance was derived from a phase shifting algorithm [31] applied to the images of pseudo-periodic patterns.…”

Section: Introductionmentioning

confidence: 99%

Development of an Image Grating Sensor for Position Measurement

Fang

Tjahjowidodo

et al. 2019

Sensors

View full text Add to dashboard Cite

In this research paper, a precision position-measurement system based on the image grating technique is presented. The system offers a better robustness and flexibility for 1D position measurement compared to a conventional optical encoder. It is equipped with an image grating attached to a linear stage as the target feature and a line scan camera as the stationary displacement reader. By measuring the position of the specific feature in the image and applying a subpixel image registration method, the position of the linear stage can be obtained. In order to improve the computational efficiency, the calculations for pattern correlation and subpixel registration are performed in the frequency domain. An error compensation method based on a lens distortion model is investigated and implemented to improve the measurement accuracy of the proposed system. Experimental data confirms the capability of the developed image grating system as ±0.3 µm measurement accuracy within a 50 mm range and ±0.2 µm measurement accuracy within a 25 mm range. By applying different optics, the standoff distance, measurement range, and resolution can be customized to conform to different precision measurement applications.

show abstract

Section: Introductionmentioning

confidence: 99%

Development of an Image Grating Sensor for Position Measurement

Fang

Tjahjowidodo

et al. 2019

Sensors

View full text Add to dashboard Cite

show abstract

“…However, the manufacturing of this interferometer unit requires complicated alignment and bonding techniques, which makes it difficult to replicate and deploy in other sensing applications. Beyond space-based gravitational-wave observation, several other applications can benefit from such compact highsensitivity laser interferometers such as spacecraft dragfree control [9,10] or the characterization and calibration of laser direct writing lithography [11], which require precisions at or below the nanometer level, as well as dimensional metrology, and machining tools in manufacturing and precision measurements, striving precisions from picometers up to microns [12].…”

Section: Introductionmentioning

confidence: 99%

Quasi-monolithic heterodyne laser interferometer for inertial sensing

Zhang,

Guzman

2022

Preprint

View full text Add to dashboard Cite

We present a compact heterodyne laser interferometer developed for high-sensitivity displacement sensing applications. This interferometer consists of customized prisms and waveplates assembled as a quasi-monolithic unit to realize a miniaturized system. The interferometer design adopts a common-mode rejection scheme to provide a high rejection ratio to common environmental noise. Experimental tests in vacuum show a displacement sensitivity level of 11 pm/ √ Hz at 100 mHz, and as low as 0.6 pm/ √ Hz above 1 Hz. The prototype unit has the size of 20 mm × 20 mm × 10 mm and weighs 4.5 g, which allows subsequent integration into compact systems.

show abstract

“…The fabrication of those devices requires a previous step of micropatterning. This consists in transferring a pre-defined design onto the substrate by means of techniques such as mask UVlithography, mask-less lithography systems such as laser-direct-writinglithography, and inkjet printing [5], [6]. The design corresponds, in most of the cases, to micrometric features.…”

Section: Introductionmentioning

confidence: 99%

Microfabrication of position reference patterns onto glass microscope slides for high-accurate analysis of dynamic cellular events

Galeano

Sandoz

Zarzycki

et al. 2017

TecnoL.

Self Cite

View full text Add to dashboard Cite

Glass microscopes slides are widely used as in situ base-substrates carrying diverse micro-fabricated systems or elements. For such purposes, the micro-fabrication process consists in transferring a pre-defined design onto the substrate made of a glass microscope slide. This is known as patterning, which is a technique that can also be used in transferring specific designs that allows region of interest (ROI) recovery under the microscope. In those cases, two main challenges appear: 1) Disturbances in light transmission should remain minimum to keep the high quality of observation of the object of interest under the microscope. 2) The pattern-size should then be small enough but, however, larger than the diffraction limit to be observable satisfactorily for positioning purposes. In this article, we present the procedures involved in the microfabrication of Pseudo-Periodic Patterns (PPP) encrypting the absolute position of an extended area. Those patterns are embedded in Pétri dishes in order to allow the highaccurate retrieval of absolute position and orientation. The presented microfabrication is based in a technique known as lift-off, which after parameter adjustment, allows the obtaining of PPP fulfilling the two previously mentioned requirements. The results report on PPP realized on glass microscope slides and composed by 2µm side dots made of aluminum with a thickness of 30nm.

show abstract

Performance Characterization of an xy-Stage Applied to Micrometric Laser Direct Writing Lithography

Cited by 8 publications

References 26 publications

Development of an Image Grating Sensor for Position Measurement

Development of an Image Grating Sensor for Position Measurement

Quasi-monolithic heterodyne laser interferometer for inertial sensing

Microfabrication of position reference patterns onto glass microscope slides for high-accurate analysis of dynamic cellular events

Contact Info

Product

Resources

About