2018
DOI: 10.1016/j.cap.2017.10.009
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Performance assessment of Cu2SnS3 (CTS) based thin film solar cells by AMPS-1D

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Cited by 48 publications
(26 citation statements)
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“…The highest contour area of the J sc is in the upper left corner of the graph, where the thickness of the LHM layer and the peak defect density are the highest and lowest, respectively. FF depends on V oc and the recombination processes in the depletion zone [66]. Therefore, compared with V oc , the trend of FF is similar.…”
Section: The Impact Of Bulk Defect Density Of Ch 3 Nh 3 Pbi 3 Lhm Layer On Device Performancementioning
confidence: 89%
“…The highest contour area of the J sc is in the upper left corner of the graph, where the thickness of the LHM layer and the peak defect density are the highest and lowest, respectively. FF depends on V oc and the recombination processes in the depletion zone [66]. Therefore, compared with V oc , the trend of FF is similar.…”
Section: The Impact Of Bulk Defect Density Of Ch 3 Nh 3 Pbi 3 Lhm Layer On Device Performancementioning
confidence: 89%
“…The decrement in p-type resistivity (increment in conductivity) is attributed to the formation of more Cu Sn antisite alongside with V Cu caused by the lower formation energy of antisite defects for Sn-rich compound [5]. However, Cu-rich condition is not desired for higher e ciency solar cell because it possesses more metallic properties rather than semiconductor properties [57]. All samples exhibited high electron mobility possibly due to the presence of Cu 4 SnS 4 phase in those samples as well as from the highly dispersed and delocalized conduction band minimum (CBM).…”
Section: Electrical Propertiesmentioning
confidence: 99%
“…Such a type of investigation provides the guidelines to obtain optimum performance from a designed solar cell without fabricating it in the laboratory. For numerical simulation of heterojunction solar cells, a solar cell capacitance simulator (SCAPS), , analysis of microelectronic and photonic structures (AMPS), , and Silvaco TCAD , have been popularly used in recent years.…”
Section: Introductionmentioning
confidence: 99%