2021
DOI: 10.1007/s12633-021-01355-2
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Performance Analysis of Heterojunction and Hetero Dielectric Triple Material Double Gate TFET

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Cited by 6 publications
(2 citation statements)
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“…Figure 9 shows transconductance(gm/Ids) of HD-DMG-US TFET comparision with Conventional-Tunnel FET, Dual Material Gate-Tunnel FET(DMG-US TFET) and HfO2 Spacer Tunnel FET(S-TFET) [27,28]. The devices that turn on at higher voltages (threshold voltages) have low gm/Ids values.…”
Section: Analog Characteristicsmentioning
confidence: 99%
“…Figure 9 shows transconductance(gm/Ids) of HD-DMG-US TFET comparision with Conventional-Tunnel FET, Dual Material Gate-Tunnel FET(DMG-US TFET) and HfO2 Spacer Tunnel FET(S-TFET) [27,28]. The devices that turn on at higher voltages (threshold voltages) have low gm/Ids values.…”
Section: Analog Characteristicsmentioning
confidence: 99%
“…34,35 When making small-scale devices, the silicon dioxide (SiO 2 ) gate insulator should be replaced with a high-k dielectric gate oxide material, such as hafnium oxide, while maintaining appropriate z E-mail: shivaniyadav.ece@gmail.com; rewarisonam@gmail.com ECS Journal of Solid State Science and Technology, 2023 12 127008 oxide thickness (EOT) as a constant. 23 Hetero Dielectric structure in which combinations of low dielectric material together with high dielectric materials are utilised for FETs have been reported in literature to boost ON current 36 and reduce the OFF state leakages. 37,38 Nanometer sized biomolecules are detectable using Gate All Around Field Effect Transistor (GAAFET) based sensors.…”
mentioning
confidence: 99%