Distinct properties of multiple phases of vanadium oxide (VO x ) render this material family attractive for advanced electronic devices, catalysis, and energy storage. In this work, phase boundaries of VO x are crossed and distinct electronic properties are obtained by electrochemically tuning the oxygen content of VO x thin films under a wide range of temperatures. Reversible phase transitions between two adjacent VO x phases, VO 2 and V 2 O 5 , are obtained. Cathodic biases trigger the phase transition from V 2 O 5 to VO 2 , accompanied by disappearance of the wide band gap. The transformed phase is stable upon removal of the bias while reversible upon reversal of the electrochemical bias. The kinetics of the phase transition is monitored by tracking the time-dependent response of the X-ray absorption peaks upon the application of a sinusoidal electrical bias. The electrochemically controllable phase transition between VO 2 and V 2 O 5 demonstrates the ability to induce major changes in the electronic properties of VO x by spanning multiple structural phases. This concept is transferable to other multiphase oxides for electronic, magnetic, or electrochemical applications.induce the phase transition in the bulk via applying gate voltages with solid-state dielectric materials. [9][10][11] On the other hand, suppression of the MIT transition below T c , and reversible control of the electrical conductivity, was achieved by use of an ionic liquid (IL) gate instead of a solid-state dielectric. [12,13] The mechanism behind ionic liquid gating was beyond simple electrostatic polarization or field effect, but instead was electrochemical in nature. The removal of lattice oxygen, leading to reduction of the lattice and creation of oxygen vacancies, was proposed as the source for the suppression of the MIT transition. [14] In spite of the promise of VO 2 as a key component for "more-than-Moore" electronic devices, [15] it has several inevitable shortcomings originating from the character of its MIT. First, the band gap of the insulator phase VO 2 (M1) is only ≈0.6 eV, [2,16] which limits the maximum attainable magnitude of device conductance on/off ratios. The achievable on/off ratio of VO 2 -based devices in single crystal form is ≈10 5 , [17] while this value might be lowered to ≈10 3 or even lower for VO 2 thin films due to the existence of oxygen nonstoichiometry [1] or cation interdiffusion. [18] This value barely suffices for main stream logic devices requiring on/off ratios of 10 3 -10 6 [19] and is far lower than ≈10 7 that is required for low power logic devices (transistors). [20] Moreover, the relatively low T c of the MIT (≈68 °C) limits the maximum device operation temperature, below which VO 2 remains semiconducting. Thus, VO 2 -based electronic devices may require active cooling to maintain temperature below T c , thereby imposing additional constraints on deployment.
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