Penning ion source based surface modification of titanium by nitrogen ion implantation
Ghulam Murtaza,
Muhammad Tariq Siddique,
Shakeel-ur-Rehman
et al.
Abstract:The nitrogen ions of the Penning ion source are bombarded on commercially available pure titanium substrates in pulses of about 5.6 μs duration. A thin film (∼500 nm) of multiphase titanium nitride is produced without additional heating of the substrate. The surface modification is studied for various energies of implanted ions at a low flux density. The 2.4 × 109 ions of specific energy are bombarded on the sample in each single pulse of the ion. Each sample is exposed to one thousand such pulses at a repetit… Show more
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