Peningkatan Kepekaan Biosensor Urea Berasaskan Resonans Plasmon Permukaan dan Tatasusunan Kretschmann dengan Struktur Hibrid Grafin-MoS2

Jamil, Nor Aini; Menon, P. Susthitha; Gan, Siew Mei; Majlis, Burhanuddin Yeop

doi:10.17576/jsm-2018-4705-20

Cited by 8 publications

(2 citation statements)

References 16 publications

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“…Herein, a proposed SPR sensor using Krestchmann configuration with urea and urease enzyme mixture offers an economical, label-free detection method for ease of operation, excellent sensitivity and rapid selectivity towards the target analyte (Gan et al 2018;Jamil et al 2018). We analysed the presence of kidney wastes such as urea at concentrations 0-800 mM in enzymatic and non-enzymatic solution using optical wavelengths of 670 nm and 785 nm.…”

Section: Introductionmentioning

confidence: 99%

High Sensitivity Au-based Kretschmann Surface Plasmon Resonance Sensor for Urea Detection

Menon¹,

Said²,

Gan³

et al. 2019

JSM

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Kretschmann-based Surface Plasmon Resonance (SPR) optical sensor was applied to detect the presence of kidney wastes such as urea in solutions. To enhance the sensitivity of the SPR sensor, nanolaminated gold film (thickness of 50 nm) was used. In this work, the SPR response to urea in various concentrations were measured and investigated using optical wavelengths of 670 nm and 785 nm. The signals were compared between pure urea solution versus mixed solution in the presence of the 0.227 µmol urease enzyme. The proposed mixed solution is to eliminate doping and gel entrapment process for enzyme immobilization in conventional method. Angular interrogation technique was used to measure the sensor performance in urea detection using pure and mixed solutions with urea concentration of 0-800 mM. Upon exposure to mixed solution using 785 nm optical wavelength, the nanolaminated gold film exhibited higher SPR sensitivity as much as 7.8 M-1 than a pure urea solution (1.4 M-1). The coupling activity between urea and urease molecules in the mixed solution near the nanolaminated gold film surface lead to sensitivity enhancement. Angle shifting of mixed solution on 50 nm-thick nanolaminated gold film using 670 nm optical wavelength was greater by ~50% compared to 785 nm. Sensorgram data shows a steady and linear increment in SPR incident angle shifting when urea concentration increased. To the best of our knowledge, this is the first time that Kretschmann-based SPR has been used for urea sensing at 670 nm and 785 nm optical wavelengths.

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Section: Introductionmentioning

confidence: 99%

High Sensitivity Au-based Kretschmann Surface Plasmon Resonance Sensor for Urea Detection

Menon¹,

Said²,

Gan³

et al. 2019

JSM

Self Cite

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“…In this work, a simulation of the optical characteristics of the designed Si inverted pyramidal microstructures is presented. Here, the light propagation is simulated using software package based on finite-difference time-domain (FDTD) method (Abdullah & Hashim 2018;Jamil et al 2018), which is simple yet precise as compared to rigorous coupled-wave approach (Shuba et al 2015;Solano et al 2013). The fabrication of the arrays of Si inverted pyramidal microstructures by wet etching using a mixture of TMAH and IPA is carried out.…”

Section: Introductionmentioning

confidence: 99%

Reflectance Characteristics of Silicon Surface Fabricated with the Arrays of Uniform Inverted Pyramid Microstructures in UV-Visible Range

Abdullah¹,

Hashim²

2019

JSM

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In this paper, inverted pyramidal microstructures are designed and fabricated on silicon (Si) surface. The characteristics of surface reflectance are simulated using two-dimensional (2D) finite-difference time-domain (FDTD) method by varying the spacing (S) and width (W) of the pyramidal microstructures. The results showed that the effect of S is more significant compared to W where the reflectance of the irradiated light has been increased gradually with the increase of S from 0 to 3 µm, and the difference is around 9.6%. Due to the etching constraint, S= 3 µm is chosen for the fabrication. Textured structure is fabricated by the anisotropic etching of tetramethyl-ammonium hydroxide (TMAH) with additional of isopropyl alcohol (IPA). Long etching time of 120 min is required to form uniform arrays of pyramidal microstructures with smooth and well-terminated four sidewalls at (111) plane. Due to the undercut etching under SiO 2 mask, it results to the formation of slightly larger W and smaller S in the fabricated structures. The measured average reflectance in UVvisible range for the Si with inverted pyramidal microstructures is very low down to 10.4%. The discrepancy between the measured and simulated values is speculated to be due to the use of 2D FDTD instead of three-dimensional (3D) FDTD. ABSTRAKDalam kertas ini, mikrostruktur piramid songsang Si bersaiz mikro telah direka bentuk dan difabrikasi di atas permukaan silikon (Si). Ciri pantulan permukaan telah disimulasi menggunakan kaedah domain-masa perbezaan-terhingga (FDTD) dua-dimensi (2D) dengan membezakan jarak dan lebar mikrostruktur piramid. Data menunjukkan kesan jarak (S) adalah lebih ketara jika dibandingkan dengan kesan lebar (W) terhadap pantulan permukaan. Pantulan cahaya yang disinarkan telah meningkat secara beransur-ansur dengan peningkatan S daripada 0 kepada 3 µm dan perbezaan adalah sekitar 9.6%. Disebabkan kekangan punaran, S= 3 µm telah dipilih untuk difabrikasi. Tekstur telah difabrikasi dengan cara punaran anisotropik oleh tetra metil ammonium hidroksida (TMAH) berserta campuran alkohol isopropil (IPA). Punaran pada tempoh yang lama iaitu 120 min diperlukan untuk membentuk jajaran mikrostruktur piramid yang seragam dengan empat sisi tepi pada satah (111) yang licin berserta penamatan yang baik. Disebabkan potongan bawah punaran di bawah topeng SiO 2 , ia membentuk W yang sedikit lebih besar dan S yang lebih kecil bagi struktur yang telah difabrikasi. Purata pantulan dalam julat UV-nampak yang telah diukur bagi Si dengan mikrostruktur piramid songsang adalah sangat rendah iaitu 10.4%. Percanggahan antara nilai yang diukur dengan nilai yang disimulasi telah dispekulasi disebabkan penggunaan FDTD 2D dan bukannya FDTD tiga-dimensi (3D).

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Robust Design of Bimetallic ZnO Nanofilm SPR Sensor using Taguchi Method

Mei

Mohamad

Jamil

et al. 2020

2020 4th IEEE Electron Devices Technology &Amp; Manufacturing Conference (EDTM)

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Peningkatan Kepekaan Biosensor Urea Berasaskan Resonans Plasmon Permukaan dan Tatasusunan Kretschmann dengan Struktur Hibrid Grafin-MoS2

Cited by 8 publications

References 16 publications

High Sensitivity Au-based Kretschmann Surface Plasmon Resonance Sensor for Urea Detection

High Sensitivity Au-based Kretschmann Surface Plasmon Resonance Sensor for Urea Detection

Reflectance Characteristics of Silicon Surface Fabricated with the Arrays of Uniform Inverted Pyramid Microstructures in UV-Visible Range

Robust Design of Bimetallic ZnO Nanofilm SPR Sensor using Taguchi Method

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