PECVD synthesis and optical properties of BCXNY films obtained from N-triethylborazine as a single-source precursor

Sulyaeva, V. S.; Косинова, М. Л.; Rumyantsev, Yu. M.; Kesler, V. G.; Kuznetsov, F. A.

doi:10.1016/j.surfcoat.2013.06.018

Cited by 26 publications

(24 citation statements)

References 35 publications

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“…The N 1s signal presents the main structure at about 398.7 eV, associated to the N-B component typical of h-BN and B-C-N compounds [4,21,36,47,49,55,56]. Also for the N 1s core level, this main component is not sufficient to account for the whole spectral density.…”

Section: Characterization Of B-c-n Layers Grown By Cvdmentioning

confidence: 95%

“…We notice that the B, C and N core-levels in mixed ternary bonding compounds can produce asymmetric peaks with large tails rather than wellresolved peaks [10,12,49]. In order to evaluate the position and relative intensity of these contributions we performed a fitting analysis, whose fitting values are reported in the Supplementary Data (Table S3) and whose results with the deconvolution in different components contributing to the signals are also reported in Figure 5 [4,21,[35][36][37][38][39][40] and Gr [41][42][43]. The C 1s line shape is an excellent fingerprint of the carbon atoms for a variety of systems on surfaces, giving direct information on their chemical environment [20,[44][45][46].…”

Section: Thermolytic Decomposition Of Methylamine Boranementioning

confidence: 99%

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Chemical vapor deposition growth of boron–carbon–nitrogen layers from methylamine borane thermolysis products

Leardini

Flores

et al. 2017

Nanotechnology

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This work investigates the growth of B-C-N layers by chemical vapor deposition using methylamine borane (MeAB) as the single-source precursor. MeAB has been synthesized and characterized, paying particular attention to the analysis of its thermolysis products, which are the gaseous precursors for B-C-N growth. Samples have been grown on Cu foils and transferred onto different substrates for their morphological, structural, chemical, electronic and optical characterizations. The results of these characterizations indicate a segregation of h-BN and graphene-like (Gr) domains. However, there is an important presence of B and N interactions with C at the Gr borders, and of C interacting at the h-BN-edges, respectively, in the obtained nano-layers. In particular, there is a significant presence of C-N bonds, at Gr/h-BN borders and in the form of N doping of Gr domains. The overall B:C:N contents in the layers is close to 1:3:1.5. A careful analysis of the optical bandgap determination of the obtained B-C-N layers is presented, discussed and compared with previous seminal works with samples of similar composition.

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Section: Characterization Of B-c-n Layers Grown By Cvdmentioning

confidence: 95%

Section: Thermolytic Decomposition Of Methylamine Boranementioning

confidence: 99%

Chemical vapor deposition growth of boron–carbon–nitrogen layers from methylamine borane thermolysis products

Leardini

Flores

et al. 2017

Nanotechnology

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“…Sulyaeva et al . showed an increase in refractive index of boron carbonitride films fabricated by PECVD from 1.5 to 2.8 with increasing temperature of deposition . Higher refractive index indicates higher crosslinking in films, which in turn is associated with superior stability in aqueous media.…”

Section: Resultsmentioning

confidence: 98%

Tailoring terpenoid plasma polymer properties by controlling the substrate temperature during PECVD

Kumar

Grant

Bazaka

et al. 2017

J of Applied Polymer Sci

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Polymers derived from natural, minimally-processed materials have recently emerged as a more sustainable alternative to synthetic polymers, with promising applications in biocompatible and biodegradable devices. Plasma-enhanced deposition is wellsuited to one-step, fast, and efficient synthesis of highly crosslinked inert polymers directly from natural resources, however, fabrication of biologically active polymers remains a challenge. Plasma processing parameters influence the properties such as surface energy, roughness, morphology, and chemical composition of deposited polymers and thus their final applications. This article reports on the important role of substrate temperature (T S ) in the chemical composition, wettability, refractive index, and crosslinking density of plasma polymers derived from terpenoids. Experiments are conducted as a function of deposition power P d , and substrate temperature, T S . T S varied from 40 to 280 8C and is externally controlled. Atomic force microscopy analysis reveals the change in deposition mechanism attributed to shadowing effect at higher T S and P d . Increase in band gap (E g ) with high T s deposition for terpenoid based plasma polymers is observed. Swelling behavior analyzed by in situ ellipsometry affirms the enhanced crosslink density with increasing deposition rate. Fourier transform infrared analysis exhibits the formation of additional chemical moieties with increasing T S . Increase in deposition rate with increasing T S at higher P d supports the theory of direct incorporation of depositing particles as dominant mechanism of plasma polymerization in this study.

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“…The interaction between total flow and N/Ar ratio is ascribed to a higher dissociation of N2 at higher total flows, given the higher number of collisions with a higher number of molecules. Please do not adjust margins Please do not adjust margins (filled squares) 10,11 , N-TMBA (stars) 6,33 , TMAB (open triangles) 13 , B2H6-CH4-N2 mixtures (open squares) 34 and BCl3-CH4-N2 mixtures (crosses) 35 .…”

Section: Please Do Not Adjust Marginsmentioning

confidence: 99%

Plasma CVD of B-C-N Thin Films Using Triethylboron in Argon-Nitrogen Plasma

Souqui¹,

Pališaitis²,

Högberg³

et al. 2020

Preprint

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<div> Amorphous boron-carbon-nitrogen (B-C-N) films with low density are potentially interesting as alternative low-dielectric-constant (low-κ) materials for future electronic devices. Such applications require deposition at temperatures below 300 °C, making plasma chemical vapor deposition (plasma CVD) a preferred deposition method. Plasma CVD of B-C-N films is today typically done with separate precursors for B, C and N or with precursors containing B–N bonds and an additional carbon precursor. We present an approach to plasma CVD of B-C-N films based on triethylboron (B(C2H5)3) a precursor with B-C bonds in an argon-nitrogen plasma. From quantitative analysis with Time-of-Flight Elastic Recoil Detection Analysis (ToF-ERDA), we find that the deposition process can afford B-C-N films with a B/N ratio between 0.98 and 1.3 and B/C ratios between 3.4 and 8.6 and where the films contain between 3.6 and 7.8 at. % H and 6.6 and 20 at. % of O. The films have low density, from 0.32 to 1.6 g/cm3 as determined from cross-section scanning electron micrographs and ToF-ERDA with morphologies ranging from smooth films to separated nanowalls. Scaning transmission electron microscopy shows that C and BN does not phase seperarte in the film. The static dielectric constant κ, measured by capacitance–voltage measurements, varies with the Ar concentration in the range from 3.3 to 35 for low and high Ar concentrations, respectively. We suggest that this dependence is caused by the energetic bombardment of plasma species during film deposition. </div>

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PECVD synthesis and optical properties of BCXNY films obtained from N-triethylborazine as a single-source precursor

Cited by 26 publications

References 35 publications

Chemical vapor deposition growth of boron–carbon–nitrogen layers from methylamine borane thermolysis products

Chemical vapor deposition growth of boron–carbon–nitrogen layers from methylamine borane thermolysis products

Tailoring terpenoid plasma polymer properties by controlling the substrate temperature during PECVD

Plasma CVD of B-C-N Thin Films Using Triethylboron in Argon-Nitrogen Plasma

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