Patterning self-assembled monolayers

Smith, Rachel K.; Lewis, Penelope A.; Weiss, Paul S.

doi:10.1016/j.progsurf.2003.12.001

Cited by 753 publications

(436 citation statements)

References 288 publications

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“…Thin films and monolayers of molecules adsorbed to surfaces have generated sustained interest due to applications in fields such as molecular and biomolecular recognition [1], corrosion protection [2] and patterning [3]. Alkanethiols are the most studied class of compounds for thin films on gold as they readily bind to the surface and the molecules may form ordered surface structures [4].…”

Section: Introductionmentioning

confidence: 99%

Thin films of ruthenium phthalocyanine complexes

et al. 2009

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Four new ruthenium phthalocyanine complexes bearing axial ligands with thioacetate groups that facilitate thin film formation on gold surfaces are presented. STM images and surface coverage data obtained by solution inductively coupled plasma mass spectrometry (ICP-MS) experiments show that peripheral and axial ligand substituents on the complexes have a significant effect on their surface coverage. A laser ablation ICP-MS technique is described here for the first time that provides information about thin films across macro-sized areas. Using the technique, the maximum surface coverage of a ruthenium phthalocyanine complex was found to occur within one minute of gold substrate immersion in the complex-containing solution.

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Section: Introductionmentioning

confidence: 99%

Thin films of ruthenium phthalocyanine complexes

et al. 2009

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“…S6). The ability of a graphene-coated HSL tip array to conduct electricity, in principle, allows one to use an electric field and HSL to electrochemically desorb an alkanethiol self-assembled monolayer (SAM) from an Au surface (23)(24)(25)(26)(27). To evaluate the prospects for electrochemical desorption, SAMs were prepared by soaking an Au-coated silicon wafer in an ethanol solution of 16-mercaptohexadecanoic acid (MHA, 1 mM) for 1 h followed by copious rinsing with ethanol and drying under N 2 .…”

Section: Resultsmentioning

confidence: 99%

Multifunctional cantilever-free scanning probe arrays coated with multilayer graphene

Shim

Brown

Zhou

et al. 2012

Proc. Natl. Acad. Sci. U.S.A.

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Scanning probe instruments have expanded beyond their traditional role as imaging or "reading" tools and are now routinely used for "writing." Although a variety of scanning probe lithography techniques are available, each one imposes different requirements on the types of probes that must be used. Additionally, throughput is a major concern for serial writing techniques, so for a scanning probe lithography technique to become widely applied, there needs to be a reasonable path toward a scalable architecture. Here, we use a multilayer graphene coating method to create multifunctional massively parallel probe arrays that have wear-resistant tips of uncompromised sharpness and high electrical and thermal conductivities. The optical transparency and mechanical flexibility of graphene allow this procedure to be used for coating exceptionally large, cantilever-free arrays that can pattern with electrochemical desorption and thermal, in addition to conventional, dip-pen nanolithography.scanning probe microscopy | tip modification | energy delivery | tip wear | friction T he ability to prepare nanoscale structures with the tip of a scanning probe has stimulated intense research efforts to use the scanning probe microscope as an instrument for nanofabrication on surfaces with high resolution, registration accuracy, and relatively low cost. These techniques rely on specific probes to enable the transfer of materials or energy from the probe to a surface: Dip-pen nanolithography (DPN) requires tips with controlled hydrophobicitiy (1-3); anodic oxidation requires electrically conductive tips (4, 5); mechanical scratching or nanografting requires rigid, wear-resistant tips (6-8); and thermal-scanning probe lithography (SPL) requires tips with integrated heaters (9). Therefore, understanding the tradeoffs inherent in using specialized SPL probes is important, especially when considering high throughput SPL techniques. A challenge common to all SPL techniques is to pattern with high throughput despite the serial nature of probe-based lithography. This has been addressed by the development of specialized systems, for example, one-(10) and two-dimensional cantilever arrays (11,12). The recent development of cantilever-free arrays provides a lowcost alternative to cantilever arrays for parallel SPL (13, 14).Recently, hard-tip, soft-spring lithography (HSL) has emerged as a technique for patterning sub-50-nm features over centimeter scales (15) by using an array of silicon tips resting on a compliant polydimethylsiloxane (PDMS) layer. These arrays are well suited for printing organic and inorganic structures in a high throughput and combinatorial fashion, but the versatility of these arrays is limited by the low electrical and thermal conductivities of PDMS. The adaptation of the cantilever-free architecture to additional SPL modalities would be powerful, but only lowtemperature processing steps that do not compromise the transparency and compliance of the PDMS layer can be considered. Considerable research has focused on improvi...

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“…Since the amount and location of the metal deposited is defined by the coordinating SAM molecules this strategy provides an unprecedented precision in the deposition process. With the range of techniques available to pattern SAMs from the micrometer range to the bottom of the nanoscale [32,[85][86][87][88] this strategy offers a flexible approach to SAM templated electrodeposition. What remains to be established is the control of the lift-off process since the use of coordinating end groups M a n u s c r i p t 16 instead of inert CH 3 moieties means stronger adhesion between the SAM and the deposit even though for clusters it has been found that they are easily removed [77].…”

Section: Discussionmentioning

confidence: 99%