Patterned Self-Assembled Monolayers on Silicon Oxide Prepared by Nanoimprint Lithography and Their Applications in Nanofabrication

Abstract

Nanoimprint lithography (NIL) is used as a tool to pattern self‐assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate‐functionalized particles is achieved. Further applications of the NIL‐patterned substrates include template‐directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.

Gestaltung der Siliciumoxidoberfläche durch selbstorganisierte Monoschichten

“…[273][274][275][276][277] Die Nanoimprint-Lithographie (NIL) [278] wurde als wirksame Alternative zum mCP von Organosilanen vorgeschlagen. [279] Eine durch NIL erhaltene PMMA-Polymerschablone steuert die Anordnung der SAM aus der Gasphase auf einer unbedeckten Substratfläche und verhindert die Bildung einer SAM auf dem bereits bedeckten Gebiet. Nach der Entfernung des Polymers erhält man SAM-Muster, die mit anderen Silanen gefüllt werden können.…”

“…Anwendungen: a) Entfernung des Polymers, Aufdampfen eines zweiten Silans und selektive Anlagerung funktionalisierter Partikel; b) selektive Anlagerung funktionalisierter Partikel, Entfernung des Polymers; c) Aufdampfung eines Metalls, Abheben des metallbeschichteten Polymers. [279] Selbstorganisierte Monoschichten auf SiO 2…”

Incorporation of Point Defects into Self‐Assembled Three‐Dimensional Colloidal Crystals

“…Among the nanopatterning techniques, nanoimprinting lithography (NIL) has recently attracted a considerable amount of attention because of its low cost and high throughput. [26,27] NIL has been demonstrated to be a suitable method for patterning various polymers as templates to direct the growth of colloidal clusters, [28] oriented colloidal crystals, [29] and colloidal crystal heterostructures. [30] Here, we demonstrate a multistep method for the incorporation of point defects in the interior of a self-assembled 3D colloidal crystal in a controllable manner.…”

Orthogonal Supramolecular Interaction Motifs for Functional Monolayer Architectures

“…Some studies focused on the combination of top-down surface patterning with self-assembly of particles via electrostatic Chapter 2 22 interactions. For example, patterning by photolithography, [33] soft lithography, [34] nanoimprint lithography, [35] and scanning probe lithography [36] have been widely used for the fabrication of electrostatically assembled nanoparticles on patterned surfaces.…”