Abstract:Resist hardening by fluorocarbon plasma for electron-beam and optical mix-and-match lithographyOptimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system Low energy electron-beam proximity projection lithography: Discovery of a missing link Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems J.An alignment technique for electron-beam ͑EB͒ lithography that corrects the wri… Show more
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