“…Silicon wafer were ultrasonically cleaned in acetone, and immersed in hydrofluoric acid (HF) solution (49% v/v Sigma Aldrich) for three seconds to remove native oxide layer. Removal of anti-reflection coating of crystalline silicon solar cell was also done with same HF as reported elsewhere (Patil et al, 2013b;Rajesh et al, 2012). The Oleylamine (OLA) was purchased from Sigma Aldrich (Tech.…”