Particle Lithography from Colloidal Self-Assembly at Liquid−Liquid Interfaces

Isa, Lucio; Kumar, Karthik; Müller, M.; Grolig, Jan Gustav; Textor, Marcus; Reimhult, Erik

doi:10.1021/nn101260f

Cited by 149 publications

(190 citation statements)

References 37 publications

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“…Furthermore, it is reported that the interparticle distance can be tuned as a function of the number of colloids added; thus corroborating with the model of repulsive particles trying to avoid each other to the maximum extend. [71,74] Figure 3.3.4 illustrates the effect of the interface composition of the resulting colloid assembly. The difference between the two cases is attributed to two factors.…”

Section: Liquid Interface-mediated Methodsmentioning

confidence: 99%

“…a high volume fraction in the oil face leads to strong repulsions and a high order in the monolayer. [100] The special properties of oil-water interfaces to yield highly regular non-close-packed monolayers was finally used by Isa and coworkers [74] to create non-close-packed monolayers on solid surfaces. They assembled positively charged amidine-functionalized polystyrene colloids at the hexane-water interface and transferred them to a negatively charged substrate by vertical lifting (Figure 3.3.6).…”

Section: Direct Assembly Of Non-close-packed Monolayers At the Oil-wamentioning

confidence: 99%

“…[122,[125][126] In the last decade, focused research efforts were initiated that widened accessible structures by innovative combinations of angular dependent evaporation and etching steps. Thus, nanoscale discs, [127] rings, [128] ellipsoids [11] and crescent shaped particles [129][130] were successfully prepared as well as hole-films, [74,131] nanobowls, [132] nanoneedles, [14] membranes [132] and arrays of pillars of different materials. [133][134][135] …”

Section: Colloidal Lithographymentioning

confidence: 99%

“…As discussed in chapter 3. spacing. [74] Similarly, assembly at the air/water interface has been exploited for the preparation of non-close-packed monolayers. [203][204] An alternative approach consists of the preparation of close-packed monolayers that are exposed to plasma in order to yield non-close-packed arrangements.…”

Section: Introductionmentioning

confidence: 99%

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Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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This thesis focuses on the controlled assembly of monodisperse polymer colloids into ordered two-dimensional arrangements. These assemblies, commonly referred to as colloidal monolayers, are subsequently used as masks for the generation of arrays of complex metal nanostructures on solid substrates.The motivation of the research presented here is twofold. First, monolayer crystallization methods were developed to simplify the assembly of colloids and to produce more complex arrangements of colloids in a precise way. Second, various approaches to colloidal lithography are designed with the aim to include novel features or functions to arrays of metal nanostructures.The air/water interface was exploited for the crystallization of colloidal monolayer architectures as it combines a two-dimensional confinement with a high lateral mobility of the colloids that is beneficial for the creation of high long range order. A direct assembly of colloids is presented that provides a cheap, fast and conceptually simple methodology for the preparation of ordered colloidal monolayers. The produced two-dimensional crystals can be transformed into nonclose-packed architectures by a plasma-induced size reduction step, thus providing valuable masks for more sophisticated lithographic processes. Finally, the controlled co-assembly of binary colloidal crystals with defined stoichiometries on a Langmuir trough is introduced and characterized with respect to accessible configurations and size ratios.Several approaches to lithography are presented that aim at introducing different features to colloidal lithography. First, using metal-complex containing latex particles, the synthesis of which is described as well, symmetric arrays of metal nanoparticles can be created by controlled combustion of the organic material of the colloids. The process does not feature an inherent limit in nanoparticle size and is able to produce complex materials as will be demonstrated for FePt alloy particles. Precise control over both size and spacing of the particle array is presented.Second, two lithographic processes are introduced to create sophisticated nanoparticle dimer units consisting of two crescent shaped nanostructures in close proximity; essentially by using a single colloid as mask to generate two structures simultaneously. Strong coupling processes of the parental plasmon resonances of the two objects are observed that are accompanied by high near-field enhancements. A plasmon hybridization model is elaborated to explain all polarization dependent shifts of the resonance positions. Last, a technique to produce laterally patterned, ultra-flat substrates without surface topographies by embedding gold nanoparticles in a silicon dioxide matrix is applied to construct robust and re-usable sensing architectures and to introduce an approach for the nanoscale patterning of solid supported lipid bilayer membranes.

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Section: Liquid Interface-mediated Methodsmentioning

confidence: 99%

Section: Direct Assembly Of Non-close-packed Monolayers At the Oil-wamentioning

confidence: 99%

Section: Colloidal Lithographymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Surface Patterning with Colloidal Monolayers

Vogel

2012

Springer Theses

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“…Dense and flocculated 2D suspensions can be used to stabilize interfaces in foams 10,11 , PickeringRamsden emulsions 12 or in so-called bijels 13,14 . 2D-colloidal crystals can be used in surface nano-patterning 15 . Furthermore, exploiting particle shape effects, for example by making the particles ellipsoidal in nature, leads to an even more spectacular stabilisation of interfaces in emulsions 16 , possible through strong effects on the interfacial rheology.…”

Section: Introductionmentioning

confidence: 99%

Adsorption of Ellipsoidal Particles at Liquid–Liquid Interfaces

Coertjens

Dier²,

Moldenaers

et al. 2017

Langmuir

Self Cite

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The adsorption of particles at liquid-liquid interfaces is of great scientific and technological importance. In particular for non-spherical particles, the capillary forces which drive adsorption vary with position and orientation and complex adsorption pathways have been predicted by simulations. Based on the latter it has been suggested that the time scales of adsorption are determined by a balance between capillary and viscous forces. However, several recent experimental results point out the role of contact line pinning in the adsorption of particles to interfaces, and even suggest that the adsorption dynamics and pathways are completely determined by the latter, with the timescales of adsorption being determined solely by particle characteristics. In the present work the adsorption trajectories of model ellipsoidal particles are investigated experimentally using cryo-SEM and monitoring the altitudinal orientation angle using high speed confocal microscopy. By varying the viscosity and the viscosity jump across the interfaces we specifically interrogate the role of viscous forces.

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Wafer‐Scale Fabrication of Ordered Binary Colloidal Monolayers with Adjustable Stoichiometries

Vogel¹,

Viguerie²,

Jonas³

et al. 2011

Adv Funct Materials

165

216

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Colloidal monolayers with high order and increased complexity beyond plain hexagonal packing geometries are useful for 2D templating of surface nanostructures and lithographic applications. Here, binary colloidal monolayers featuring a close‐packed monolayer of large spheres (L) with a superlattice of small particles (S) are prepared in a single step using a Langmuir trough. Adjustment of the stoichiometry of the two particle types at the air–water interface leads to a high degree of control over the occupation of the interstitial sites in the close‐packed layer of large spheres by the small colloids. Thus, large areas of binary 2D crystals with LS2, LS6, and LS9 structures are fabricated in a controlled way. The process allows the formation of binary crystals over a wide range of particle size ratios from 0.19 to 0.40. The pH value of the subphase can be used to enhance the crystallization process by changing the contact angle of the particles at the interface. An interfacial polymerization of butyl cyanoacrylate is used to directly image the contact angle of the colloids at the interface. Transfer to solid substrates is achieved by a surface lowering technique. A variety of substrates with arbitrary topographies can thus be decorated with colloidal monolayers. Applied to a lithographic process, such monolayer architectures allow the generation of complex patterns, not accessible with conventional close‐packed monolayers.

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Particle Lithography from Colloidal Self-Assembly at Liquid−Liquid Interfaces

Cited by 149 publications

References 37 publications

Surface Patterning with Colloidal Monolayers

Surface Patterning with Colloidal Monolayers

Adsorption of Ellipsoidal Particles at Liquid–Liquid Interfaces

Wafer‐Scale Fabrication of Ordered Binary Colloidal Monolayers with Adjustable Stoichiometries

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