2015
DOI: 10.1179/1743294414y.0000000418
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Part II. Oxidation of yttrium doped Cr2AlC films in temperature range between 700 and 1200°C

Abstract: The isothermal oxidation behaviour of Cr 2 AlC films deposited with 0?1-0?3 at.%Y addition on alumina substrates was investigated at temperatures between 700 and 1200uC for hold times of 1 to 30 h. It was found that the Y atoms impede the bulk diffusion of Al and Cr atoms and, thus, the initial transformation of the disordered solid solution (Cr, Al) 2 C x to the ordered Cr 2 AlC-MAX phase. It also reduces the oxidation rate of the ordered Cr 2 AlC-MAX phase and promotes the a-Al 2 O 3 phase formation relative… Show more

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Cited by 13 publications
(82 citation statements)
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“…The characterisation of the layer structure, surface morphology and the microstructure both after production as well as after the oxidation process was carried out by XRD, scanning electron microscopy (SEM) and transmission electron microscopy. [1][2][3] The results of magnetic measurements of Cr-Al-C thin films synthesised by HIPIMS at low deposition temperatures and bulk Cr 2 AlC samples were described in Ref. 4.…”
Section: Methodsmentioning
confidence: 99%
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“…The characterisation of the layer structure, surface morphology and the microstructure both after production as well as after the oxidation process was carried out by XRD, scanning electron microscopy (SEM) and transmission electron microscopy. [1][2][3] The results of magnetic measurements of Cr-Al-C thin films synthesised by HIPIMS at low deposition temperatures and bulk Cr 2 AlC samples were described in Ref. 4.…”
Section: Methodsmentioning
confidence: 99%
“…2,3 It is easiest to observe what happens after the minimum in the magnetic signal is reached by using the higher temperature of 900uC. When the minimal in the magnetic signal is reached the samples have Cr 2 AlC.…”
Section: Magnetic Model For Cr-al-c Films Under the Influence Of Oxidmentioning
confidence: 99%
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