2016 IEEE International Conference on Plasma Science (ICOPS) 2016
DOI: 10.1109/plasma.2016.7534044
|View full text |Cite
|
Sign up to set email alerts
|

Parametric study of the electron temperature and density in dusty low-pressure RF plasmas with pulsed injection of hexamethyldisiloxane

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2022
2022
2022
2022

Publication Types

Select...
1

Relationship

1
0

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 1 publication
0
1
0
Order By: Relevance
“…[18,25]. During nanocomposite thin film deposition using a DLRI, this can play an important role (i) on the dissociation kinetics of the matrix precursor [26], (ii) on the charging and transport dynamics of nanoparticles in the plasma [27], (iii) on the plasma-substrate interaction during thin film deposition [28], and therefore, (iv) on the physical and chemical properties of the coatings [29]. As a building block towards a better understanding of plasma processes using the DLRI, the objective of this study is to gain insights into the physics driving low-pressure RF plasmas with pulsed gas injection.…”
Section: Introductionmentioning
confidence: 99%
“…[18,25]. During nanocomposite thin film deposition using a DLRI, this can play an important role (i) on the dissociation kinetics of the matrix precursor [26], (ii) on the charging and transport dynamics of nanoparticles in the plasma [27], (iii) on the plasma-substrate interaction during thin film deposition [28], and therefore, (iv) on the physical and chemical properties of the coatings [29]. As a building block towards a better understanding of plasma processes using the DLRI, the objective of this study is to gain insights into the physics driving low-pressure RF plasmas with pulsed gas injection.…”
Section: Introductionmentioning
confidence: 99%