Parametric study of synthesis conditions in plasma-enhanced CVD of high-quality single-walled carbon nanotubes

Maschmann, Matthew R.; Amama, Placidus B.; Goyal, A.; Iqbal, Zafar; Gat, R.; Fisher, Timothy S.

doi:10.1016/j.carbon.2005.07.027

Cited by 90 publications

(63 citation statements)

References 27 publications

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“…The CNTs were grown in a PECVD system under conditions described by Maschmann et al [18]. The conditions chosen for the iron catalyst include growth at 900°C with a methane flow rate of 5-10 sccm (standard cubic centimeters per minute) and a hydrogen flow rate of 50 sccm.…”

Section: Plasma Enhanced Chemical Vapor Deposition (Pecvd) System Growthmentioning

confidence: 99%

Effects of carbon nanotube arrays on nucleate pool boiling

Ujereh

Fisher

Mudawar

2007

International Journal of Heat and Mass Transfer

248

113

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Experiments were performed to assess the impact coating silicon and copper substrates with nanotubes (CNTs) have on pool boiling performance. Different CNT array densities and area coverages were tested on 1.27 Â 1.27 mm 2 samples in FC-72. The CNT preparation techniques used provided strong adherence of CNTs to both substrate materials. Very small contact angle enabled deep penetration of FC-72 liquid inside surface cavities of smooth uncoated silicon surfaces, requiring unusually high surface superheat to initiate boiling. Fully coating the substrate surface with CNTs was highly effective at reducing the incipience superheat and greatly enhancing both the nucleate boiling heat transfer coefficient and critical heat flux (CHF). Efforts to further improve boiling performance by manipulating CNT area coverage of the substrate surface proved ineffective; best results were consistently realized with full surface coverage. Greater enhancement was achieved on silicon than on copper since, compared to uncoated copper surfaces, the uncoated silicon surfaces were very smooth and void of any sizeable nucleation sites to start with. This study is concluded with detailed metrics to assess the enhancement potential of the different CNT array densities and area coverages tested.

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Section: Plasma Enhanced Chemical Vapor Deposition (Pecvd) System Growthmentioning

confidence: 99%

Effects of carbon nanotube arrays on nucleate pool boiling

Ujereh

Fisher

Mudawar

2007

International Journal of Heat and Mass Transfer

248

113

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“…10,11 A detailed description of the PECVD system and the relevant CNT growth conditions have been reported elsewhere. 12,13 Individual MWCNTs were randomly selected for this study. After selection, an individual MWCNT was gently deposited onto a freshly cleaned transparent glass substrate, and metal electrodes were then thermally evaporated on top of both ends.…”

mentioning

confidence: 99%

Determining the optimal contact length for a metal/multiwalled carbon nanotube interconnect

Lan

Zakharov

Reifenberger

2008

Applied Physics Letters

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A focused ion beam (FIB) is used to sequentially reduce the contact length of an evaporated metal film to a multiwalled carbon nanotube (MWCNT). By using this FIB contact cutback technique, the contact resistance between an individual MWCNT and evaporated thin films of Au, Au∕Ti, and Ag are accurately determined. The data permit a rational way to specify the minimum contact length of a metallic thin film to a MWCNT.

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“…A detailed description of the PECVD system and the relevant CNT growth conditions has been reported elsewhere. 14 The catalyst fabrication process followed a procedure previously described. 15 MWNT samples were characterized using a field emission scanning electron microscope ͑FESEM͒ ͑Hitachi S4800͒ and a Raman spectrometer ͑Renishaw Raman imaging microscope͒ with a 785 nm ͑1.58 eV͒ laser as the excitation source.…”

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confidence: 99%

Correlating electrical resistance to growth conditions for multiwalled carbon nanotubes

Lan

Amama

Fisher

et al. 2007

Applied Physics Letters

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A correlation between growth temperature and electrical resistance of multiwalled carbon nanotubes (MWNTs) has been established by measuring the resistance of individual MWNTs grown by microwave plasma-enhanced chemical vapor deposition (PECVD) at 800, 900, and 950°C. The lowest resistances were obtained mainly from MWNTs grown at 900°C. The MWNT resistance is larger on average at lower (800°C) and higher (950°C) growth temperatures. The resistance of MWNTs correlated well with other MWNT quality indices obtained from Raman spectra. This study identifies a temperature window for growing higher-quality MWNTs with fewer defects and lower resistance by PECVD.

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Parametric study of synthesis conditions in plasma-enhanced CVD of high-quality single-walled carbon nanotubes

Cited by 90 publications

References 27 publications

Effects of carbon nanotube arrays on nucleate pool boiling

Effects of carbon nanotube arrays on nucleate pool boiling

Determining the optimal contact length for a metal/multiwalled carbon nanotube interconnect

Correlating electrical resistance to growth conditions for multiwalled carbon nanotubes

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