2012
DOI: 10.4028/www.scientific.net/amr.626.942
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Parametric Study and Thickness Evaluation of Photoresist Development for the Formation of Microgap Electrodes Using Surface Nanoprofiler

Abstract: A compact nanolaboratory on single chip is one of the challenging tasks for future reproductively of sensitive and selective lab-on-chip. This paper reports a simple and controllable technique for patterning microgap structures on (PR-1 2000A) positive photoresist. For the pattern transformation conventional lithography technique was used integrated with precise resolution mask namely chrome mask. This technique provides an especially simple method for the formation of micro features sizes of gaps onto the pho… Show more

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Cited by 2 publications
(2 citation statements)
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“…The AutoCAD software which was successfully implemented and showed an excellent result in our previous research [5,6,[10][11][12][13][14], was used for the designing of various dimensions micro channel mask, having the length and width of 0.950 mm and 0.01 mm respectively. The Figure 1…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The AutoCAD software which was successfully implemented and showed an excellent result in our previous research [5,6,[10][11][12][13][14], was used for the designing of various dimensions micro channel mask, having the length and width of 0.950 mm and 0.01 mm respectively. The Figure 1…”
Section: Methodsmentioning
confidence: 99%
“…However the silicon cost and long tools fabrication requirement limited its demands. Therefore most of researches are focusing on alternative substrate namely polydimethylsiloxane (PDMS) for fast prototyping [10][11][12][13]. PDMS itself shows good biocompatibility and moreover its elastic nature makes it a good candidate for Lab-on-chip devices [6][7].…”
Section: Introductionmentioning
confidence: 99%