Parallel writing on zirconium nitride thin films by local oxidation nanolithography

Farkas, Natalia; Comer, Jeffrey; Zhang, G.; Evans, Edward A.; Ramsier, R. D.; Wight, Scott A.; Dagata, John A.

doi:10.1063/1.1833569

Cited by 21 publications

(19 citation statements)

References 24 publications

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“…Millimeter square regions have been patterned in a few seconds by using stamps with millions of nanometer-size protrusions, each of them acting as single AFM tip. 31,32 Those experiments open new routes for bridging nano and macroscale devices.…”

Section: Local Oxidation Nanolithographymentioning

confidence: 99%

Nano-chemistry and scanning probe nanolithographies

García¹,

Martínez²,

Martínez³

2006

Chem. Soc. Rev.

359

306

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The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The unique imaging and manipulation properties of atomic force microscopes have prompted the emergence of several scanning probe-based nanolithographies. In this tutorial review we present the most promising probe-based nanolithographies that are based on the spatial confinement of a chemical reaction within a nanometer-size region of the sample surface. The potential of local chemical nanolithography in nanometer-scale science and technology is illustrated by describing a range of applications such as the fabrication of conjugated molecular wires, optical microlenses, complex quantum devices or tailored chemical surfaces for controlling biorecognition processes.

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Section: Local Oxidation Nanolithographymentioning

confidence: 99%

Nano-chemistry and scanning probe nanolithographies

García¹,

Martínez²,

Martínez³

2006

Chem. Soc. Rev.

359

306

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“…This parallel-micropatterning process was named "constructive microlithography", [15] by analogy with constructive nanolithography, the corresponding nanopatterning process carried out with the help of a conductive SFM tip. [2,3] Similarly, processes of parallel local-oxidation patterning of silicon [16,17] and, more recently, zirconium nitride [18] were demonstrated using several different conductive stamps. As in the serial local oxidation with SFM probes, the mechanism of information transfer from stamp to surface in these parallel-patterning processes was shown to be electrochemical, depending on the formation of water bridges at the interface between the stamp and the stamped surface.…”

mentioning

confidence: 98%

“…[1,3] Demonstrations of actual parallel patterning of large surface areas by local-oxidation lithography were subsequently reported in a number of publications. [15][16][17][18] Using transmission electron microscopy (TEM) copper grids as hydrophilic conductive stamps, we were able to non-destructively pattern OTS/Si monolayers in the micrometer-millimeter dimension range. [15] Such micrometer-sized monolayer patterns were then used as templates for the guided self-assembly of a second OTS monolayer, resulting in elevated bilayer copies of the respective 2D imprints.…”

mentioning

confidence: 99%

Contact Electrochemical Replication of Electrochemically Printed Monolayer Patterns

Hoeppener¹,

Maoz²,

Sagiv³

2006

Advanced Materials

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“…[4][5][6][7][8][9][10] Field-induced techniques have been employed to pattern larger areas in parallel through the use of a stamp coated with conducting material. [20][21][22] The ultimate lateral resolution of field-induced lithography is directly related to the dimensions of the protruding features of the stamp or the sharpness of the scanning probe. Recently, there have been ongoing efforts to replace the water in the tip/substrate gap with organic solvents in order to explore novel field-induced chemical reactions.…”

mentioning

confidence: 99%

High‐Field Scanning Probe Lithography in Hexadecane: Transitioning from Field Induced Oxidation to Solvent Decomposition through Surface Modification

et al. 2007

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In the recent past, a variety of scanning-probe techniques [1][2][3] have been employed to generate nanometer-size structures on semiconducting, [4][5][6][7][8][9][10] metallic, [11,12] and organic surfaces. [13][14][15][16][17][18][19] In general, these methods utilize the proximity of the scanning probe to generate an intense electric field (ca. 10 9 V m -1 ) by applying a relatively low bias of the order of a few volts. The oxidation of silicon in air using surface adsorbed water as the medium between tip and substrate has been studied most extensively. [4][5][6][7][8][9][10] Field-induced techniques have been employed to pattern larger areas in parallel through the use of a stamp coated with conducting material. [20][21][22] The ultimate lateral resolution of field-induced lithography is directly related to the dimensions of the protruding features of the stamp or the sharpness of the scanning probe. Recently, there have been ongoing efforts to replace the water in the tip/substrate gap with organic solvents in order to explore novel field-induced chemical reactions. [23][24][25][26][27][28][29] For example, the deposition of etch resistant features was previously demonstrated in our laboratories [24] using common solvents such as toluene, n-octane, ethyl alcohol, and dioxane as the medium between the sample and the tip of an atomic force microscope (AFM) operated in fluid. Similarly, recent work was performed by Garcia and co-workers [23,26] using an ethyl alcohol meniscus in the tip/substrate gap. Most recently, the same group has achieved < 5 nm resolution using a solvent meniscus condensed from octane vapour.[27] Of particular relevance to our work, are the findings reported by Hersam and co-workers [28,29] for contact mode patterning in hexadecane on H:Si(111). Both the growth kinetics and the chemical behavior of the deposited features were consistent with field induced oxidation (FIO) of silicon. The authors conclude that oxidation of the silicon surface occurs in the meniscus formed between the probe and the surface by the water dissolved in the fluid, with minimal effects on the reaction from the surrounding solvent. It is important to note that the water content in hexadecane is reported to be three-fold higher than that found in n-octane at same pressure and humidity.[30]In the present work, the role of surface hydrophobocity in the high field scanning probe nanolithography in hexadecane is investigated. A schematic representation of the setup employed is shown in Figure 1a. In this setup, both the probe of the atomic force microscope and the sample are immersed in the solvent to carry out the patterning and the initial imaging of the nanostructures. For patterning, a potential difference is applied between the probe and the sample (positive on the sample) while the tip is translated across the desired location kept in close proximity to the surface. The results obtained after patterning both a hydrophilic silicon oxide surface (contact angle ca. 0°) and hydrophobic TMS terminated surface (contact ...

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Parallel writing on zirconium nitride thin films by local oxidation nanolithography

Abstract: Characterization of zirconium nitride films sputter deposited with an extensive range of nitrogen flow rates J. Vac. Sci. Technol. A 26, 297 (2008); 10.1116/1.2839856 SPM oxidation and parallel writing on zirconium nitride thin films

Cited by 21 publications

References 24 publications

Nano-chemistry and scanning probe nanolithographies

Nano-chemistry and scanning probe nanolithographies

Contact Electrochemical Replication of Electrochemically Printed Monolayer Patterns

High‐Field Scanning Probe Lithography in Hexadecane: Transitioning from Field Induced Oxidation to Solvent Decomposition through Surface Modification

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